Substrate Processing Apparatus Synchronizing Ventilation and Light Emission
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Solution Overview
Problem
Existing substrate processing methods face challenges in achieving uniformity of processing due to air flow-induced unevenness in processing chambers, despite rotation of substrates and light sources, as ventilation air flow can still cause processing unevenness.
Innovation Solution
A substrate processing apparatus with a processing chamber, a light source, a rotation driving unit for rotating at least one of the substrate and light source, and an opening/closing mechanism that controls air flow and light emission in synchronization to reduce processing unevenness by adjusting the light emission and rotation speeds in coordination with air flow states.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate is rotated and light source is radiated in a ventilated processing chamber, then processing speed is improved, but processing uniformity deteriorates due to air flow-induced illuminance spots
Solution Approach 1:
The patent applies periodic action by cyclically switching the opening/closing mechanism between open and closed states. During the open state, ventilation is provided to maintain processing speed; during the closed state, the processing chamber is sealed to eliminate air flow and achieve uniform light emission. This periodic switching resolves the contradiction by alternating between the two conflicting requirements.
Solution Approach 2:
The patent applies preliminary action by pre-cooling the light source before irradiation and pre-adjusting the opening/closing mechanism timing. The light source is cooled in advance to prevent thermal drift during operation, and the ventilation timing is pre-coordinated with the light emission cycles to ensure uniform processing conditions are established before the actual processing begins.
2Temperature
If ventilation is provided in the processing chamber, then temperature control is improved, but light emission uniformity deteriorates due to air flow interference
Solution Approach 1:
The patent implements periodic action by synchronizing the opening/closing mechanism with light emission cycles. Ventilation is activated during specific phases when the light source is not emitting or when the substrate is not in the critical exposure zone, thereby maintaining temperature control while preventing air flow from distorting the light emission uniformity during critical processing phases.
Solution Approach 2:
The patent applies local quality by providing ventilation selectively in specific regions and time periods rather than continuous uniform ventilation. The opening/closing mechanism creates localized ventilation zones that are activated only when and where needed for temperature management, while other regions maintain stable atmospheric conditions for uniform light emission.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the uniformity of processing by reducing illuminance spots and processing unevenness caused by air flow, leading to improved consistency in energy ray exposure and processing outcomes.
Implementation Method 1
a substrate processing method in which a substrate on which a film to be processed is formed is disposed in a processing chamber of an oxygen-containing atmosphere having a gas flow rate of 10 cm/sec or less, and the substrate is irradiated with ultraviolet rays to remove a part of the film to be processed from the substrate
Data Source
AI summary
Disclosed is a substrate processing apparatus including: a processing chamber that accommodates a substrate; a light source that radiates energy rays for a processing to the substrate in the processing chamber; a rotation driving unit that rotates at least one of the substrate and the light source around an axis intersecting with the substrate in the processing chamber; an opening/closing mechanism that switches between an open state and a closed state; and a controller configured to control the opening/closing mechanism to switch between the open state and the closed state, to increase a light emission amount of the light source in synchronization with the switch of the open state to the closed state by the opening/closing mechanism, and to decrease the light emission amount of the light source in synchronization with the switch of the closed state to the open state by the opening/closing mechanism.