Substrate Processing Apparatus Temperature Feedback Control

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Solution Overview

Problem

Conventional substrate processing apparatuses face challenges in maintaining uniform processing quality due to uncertain chemical liquid temperatures during pre-dispensing, leading to unnecessary chemical liquid discharge and reduced throughput.

Innovation Solution

A substrate processing apparatus with a discharge port, supply passage, and temperature detection unit that stabilizes the processing fluid temperature by detecting it at a pre-dispensing position before switching to the processing position, reducing unnecessary discharge and improving uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the discharge time of chemical liquid is extended to ensure stable temperature, then processing quality uniformity is improved, but throughput decreases and chemical liquid consumption increases

Engineering Contradiction:
Improveprocessing quality uniformityVSAvoidthroughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent implements a feedback control system where a temperature detection unit continuously monitors the actual temperature of the chemical liquid discharged from the nozzle. The controller receives this temperature information and adjusts the discharge time accordingly, stopping the discharge when the target temperature is reached. This closed-loop feedback mechanism eliminates the need for extended discharge times while ensuring temperature stability, thus maintaining processing quality uniformity without sacrificing throughput.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent replaces the conventional mechanical timing-based discharge control with a temperature-based intelligent control system. Instead of using a predetermined discharge time to ensure temperature stability, the system uses a temperature detection unit and controller to monitor and adjust discharge based on actual temperature conditions. This substitution of mechanical timing with intelligent temperature-based control optimizes both processing quality and throughput.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If the discharge time of chemical liquid is extended to ensure stable temperature, then processing quality uniformity is improved, but chemical liquid consumption increases

Engineering Contradiction:
Improveprocessing quality uniformityVSAvoidchemical liquid consumption
Core Design Contradiction:
Manufacturing precisionVSLoss of substance

Solution Approach 1:

The temperature detection unit provides real-time feedback on the chemical liquid temperature to the controller. The controller uses this information to stop the discharge precisely when the target temperature is achieved, preventing unnecessary discharge of chemical liquid. This feedback-based control ensures that chemical liquid is discharged only as long as needed for temperature stabilization, reducing waste while maintaining processing quality uniformity.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system enables the chemical liquid itself to indicate when it has reached the appropriate temperature through the temperature detection unit. The liquid's own thermal state serves as the control signal, allowing the system to automatically determine when discharge should stop without requiring excessive discharge time or chemical liquid consumption.

Inventive Principle:
Principle #25Self-service

3Device complexity

If the actual temperature of chemical liquid is not monitored, then device complexity is reduced, but processing quality uniformity deteriorates

Engineering Contradiction:
Improvesystem simplicityVSAvoidprocessing quality uniformity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent introduces a temperature detection unit that provides real-time temperature information to the controller. This feedback mechanism allows the system to monitor the actual temperature of the chemical liquid and adjust the discharge timing accordingly, ensuring consistent processing quality. The added complexity of the temperature monitoring system is minimal compared to the significant improvement in processing quality uniformity it achieves.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent replaces simple timing-based discharge control with an intelligent temperature-based control system. The temperature detection unit and controller work together to monitor and adjust discharge based on actual temperature conditions, substituting mechanical timing with smart temperature-based decision-making. This substitution adds minimal complexity while dramatically improving processing quality uniformity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach stabilizes the processing fluid temperature, reduces chemical liquid consumption, and enhances processing quality by accurately controlling the discharge based on actual fluid temperatures.

Implementation Method 1

a downstream temperature detection unit that detects a temperature of a processing fluid supplied from the discharge port to the pot

Methodology Applied
Scientific EffectTemperature detection: Thermocouple

Data Source

PatentUS9793176B2Substrate processing apparatus and substrate processing method
Publication Date: 2017.10.17 SCREEN HOLDINGS CO LTD
  • US9793176B2 patent drawing
  • US9793176B2 patent drawing
  • US9793176B2 patent drawing

AI summary

The temperature of a chemical liquid supplied to a pot is detected while allowing a processing liquid discharge port to discharge the chemical liquid toward the pot at a pre-dispensing position. The temperature of the chemical liquid rises in response to the lapse of time. When the temperature of the chemical liquid supplied to the pot reaches a second target temperature, the processing liquid discharge port is allowed to stop the discharge of the chemical liquid. Thereafter, a positional relationship between the processing liquid discharge port and the pot is changed, and the processing liquid discharge port is allowed to discharge the chemical liquid toward the substrate at the processing position.