Substrate Liquid Processing Apparatus Vertical Layout Optimization
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate liquid processing apparatuses require a large space due to the placement of the reservoir and liquid sending mechanism under the processing block, limiting their space-saving capabilities.
Innovation Solution
The apparatus is redesigned with the reservoir and liquid sending mechanism positioned directly under the transfer section and processing section, respectively, allowing for a more compact layout and efficient use of space by shortening the circulation lines and optimizing the arrangement of processing units and tanks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the reservoir and liquid sending mechanism are located in the same place under the processing block, then the structure is simple and easy to maintain, but a relatively large space needs to be secured under the processing block
Solution Approach 1:
The patent divides the liquid supply system into separate functional modules: the reservoir is positioned under the transfer section while the liquid sending mechanism is positioned under the processing section. This segmentation allows each component to occupy independent spatial zones, reducing the concentrated space requirement under the processing block while maintaining system functionality.
Solution Approach 2:
The patent redistributes components along the vertical dimension by placing the reservoir under the transfer section and the liquid sending mechanism under the processing section, utilizing the vertical space more efficiently. This dimensional redistribution reduces the horizontal footprint and optimizes the overall space utilization of the apparatus.
2Area of stationary object
If the reservoir and liquid sending mechanism are separated into different locations, then space is saved under the processing block, but the circulation line length increases
Solution Approach 1:
The patent optimizes the local positioning of the liquid sending mechanism directly under the processing section, ensuring that the circulation line connecting the reservoir to the processing unit remains as short as possible. This local optimization minimizes the circulation line length while still achieving space-saving benefits by separating the reservoir from the processing block area.
3Device complexity
If multiple processing units are served from a single reservoir location, then the structure is simplified, but uniform processing conditions across all units may be compromised
Solution Approach 1:
The patent assigns dedicated liquid sending mechanisms to specific processing sections, creating localized supply zones. This segmentation ensures that each processing unit receives liquid under controlled, uniform conditions while the overall system structure remains organized and manageable through modular design.
Data Source
AI summary
A substrate liquid processing apparatus includes a transfer section, a processing section, a reservoir and a liquid sending mechanism. The transfer section includes a transfer device configured to transfer a substrate. The processing section is provided adjacent to the transfer section in a horizontal direction, and includes a liquid processing unit configured to process the substrate by using a processing liquid. The reservoir is configured to store the processing liquid therein. The liquid sending mechanism is configured to send out the processing liquid stored in the reservoir into the liquid processing unit. The reservoir is disposed directly under the transfer section. Further, the liquid sending mechanism is disposed directly under the processing section. Space saving of the substrate liquid processing apparatus can be achieved.