Substrate Container Purge Flow Module for Multi-Point Gas Distribution
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Solution Overview
Problem
Existing substrate container systems face challenges in efficiently distributing purge gas, leading to potential contamination and reduced yield due to improper gas flow management during processing.
Innovation Solution
A purge flow distribution system that includes a purge module configured to filter and direct purge gas into a substrate container through multiple points of introduction, improving purging operations by enhancing gas distribution within the container.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If purge gas is introduced through a single diffuser location, then the purge assembly structure is simple, but the gas distribution is insufficient leading to contamination risks
Solution Approach 1:
The purge gas distribution system is segmented into multiple independent diffusers positioned at different locations within the substrate container. Each diffuser receives purge gas through separate flow paths from the purge module, enabling multi-point introduction of purge gas to improve distribution effectiveness and reduce contamination risks while maintaining relatively simple individual diffuser structures
Solution Approach 2:
The purge module serves multiple functions simultaneously: it filters incoming purge gas, distributes it through multiple flow paths to different diffusers, and controls flow rates to each location. This multi-functional design improves purge effectiveness without requiring separate complex systems for each function
2Reliability
If diffusers are installed inside the substrate container, then gas distribution can be optimized, but installation complexity and particle generation increase
Solution Approach 1:
The diffusers are nested within the substrate container structure, with each diffuser positioned to optimize gas distribution to specific regions. The nested arrangement allows diffusers to be integrated into the container's existing structure, achieving optimized gas distribution while minimizing installation complexity by utilizing the container's built-in fittings and mounting points
3Object-affected harmful factors
If standard flow rate diffusers are used, then the purge assembly is simple to manufacture, but contamination control is insufficient
Solution Approach 1:
Different diffusers are positioned at specific locations within the substrate container to address local contamination risks. Each diffuser is strategically placed to target particular regions where contamination is most likely to occur, such as near substrate loading ports or sensitive processing areas. This localized approach improves contamination control without requiring a completely complex distribution system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces contamination risks and improves processing yields by ensuring optimal distribution of purge gas within the substrate container, minimizing the likelihood of installation errors and particle generation.
Implementation Method 1
A purge module can be configured to filter a received flow and direct a first portion of the filtered received flow to a diffuser
Data Source
AI summary
A method and purge flow distribution module for controlling flow of purge gas into a substrate container is provided. The purge flow distribution module includes a purge module comprising an inlet for receiving a flow of purge gas, a check valve for regulating a flow direction of the purge gas, a filter, and a filter retainer. A diffuser retainer and a diffusion device can be attached to the filter retainer. The purge module can provide a portion of a flow to the diffusion device and a second portion of the flow can leave the purge module. The purge module can be installed into a housing to define a chamber. The chamber can receive the second portion of the flow and direct the second portion of the flow to another diffusion device.