Substrate Storage Purging Layout for Low-Gas Lithography Handling

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Solution Overview

Problem

Existing substrate storage systems in lithographic apparatuses face inefficiencies in purging substrates, leading to high gas consumption and increased costs, as well as potential degradation of lithographically exposed substrates due to interaction with ambient air during processing delays.

Innovation Solution

A substrate storage system with a dedicated loading position for purging and non-purged storage positions, utilizing a purging system that minimizes gas usage by primarily purging only at the loading position, and maintaining a controlled environment to protect substrates from ambient air.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a purging system is provided to purge substrates in the substrate storage system, then substrates are protected from environmental degradation, but gas consumption increases and purging performance decreases

Engineering Contradiction:
Improvesubstrate protection from degradationVSAvoidgas consumption
Core Design Contradiction:
ReliabilityVSLoss of substance

Solution Approach 1:

The patent applies local quality by providing purging specifically at the loading position where substrates are most vulnerable to contamination during loading/unloading operations, rather than purging the entire substrate storage system uniformly. This localized approach protects substrates where needed while minimizing gas consumption in areas where protection is less critical.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The substrate storage system is segmented into different zones: a loading position that receives purging and storage positions that are mainly non-purged. This segmentation allows the system to apply purging resources selectively to the loading position while leaving storage positions with minimal or no purging, thereby reducing overall gas consumption while maintaining substrate protection where it matters most.

Inventive Principle:
Principle #1Segmentation

2Loss of substance

If substrates are stored in a mainly non-purged space, then gas consumption is reduced, but substrates may be exposed to ambient air during storage

Engineering Contradiction:
Improvegas consumptionVSAvoidambient air exposure
Core Design Contradiction:
Loss of substanceVSObject-affected harmful factors

Solution Approach 1:

The system performs preliminary purging action at the loading position before substrates are transferred to storage positions. This preliminary protection ensures that substrates are protected from ambient air contamination during the critical loading/unloading phases, while allowing them to be stored in a mainly non-purged environment afterward, thus balancing protection needs with gas consumption reduction.

Inventive Principle:
Principle #10Preliminary action

3Reliability

If purging is performed continuously across all positions, then substrate protection is maximized, but system complexity and cost increase

Engineering Contradiction:
Improvesubstrate protectionVSAvoidpurging system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The purging system is designed with local quality by concentrating purging resources at the loading position where substrates are handled and most vulnerable to contamination. This localized purging approach simplifies the overall system compared to continuous purging of all storage positions, while still providing adequate substrate protection during critical operations.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Reduces gas consumption and costs while effectively protecting substrates from environmental degradation, enhancing the efficiency and reliability of lithographic processes.

Implementation Method 1

a purging system to mainly purge the substrate when located in the loading position

Methodology Applied
Scientific EffectPurging:

Data Source

PatentEP4672308A1Substrate storage system, substrate handling apparatus, method of temporarily storing a substrate
Publication Date: 2025.12.31 ASML NETHERLANDS BV
  • EP4672308A1 patent drawingFigure 1~2
  • EP4672308A1 patent drawingFigure 3
  • EP4672308A1 patent drawingFigure 4

AI summary

The invention relates to a substrate storage system comprising an enclosure, a substrate loading port to load a substrate into and/or unload a substrate from a loading position within the enclosure, and a substrate holder to hold a substrate within the enclosure. The substrate holder is configured to move the substrate between the loading position and at least one storage position spaced from the loading position. The substrate storage system further comprises a purging system to mainly purge the substrate when located in the loading position, and wherein the at least one storage position is a mainly non-purged space.