Substrate Recipe Disturbance Compensation for Chamber Control
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Solution Overview
Problem
Conventional substrate processing systems reactively attempt to compensate for disturbances during recipe operations, leading to inconsistent and low-quality substrate production due to uncompensated fast-changing and unmodeled disturbances, resulting in non-uniform features and reduced substrate-to-substrate consistency.
Innovation Solution
A method and system that determine disturbance data by comparing sensor data with setpoint data and calculate actuation values for processing chamber components to preemptively compensate for disturbances during subsequent iterations of substrate processing recipes, thereby maintaining optimal conditions and improving tracking performance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional substrate processing systems reactively attempt to compensate for disturbances during recipe operations, then the system structure remains simple, but the manufacturing precision and substrate quality deteriorate due to uncompensated fast-changing disturbances
Solution Approach 1:
The system performs preliminary disturbance compensation by calculating actuation values based on disturbance data from previous iterations before the actual recipe operation executes. This allows the system to proactively adjust processing chamber conditions to compensate for anticipated disturbances, improving manufacturing precision without requiring complex real-time control mechanisms during the actual processing
Solution Approach 2:
The system implements feedback by continuously monitoring sensor data during recipe operations, comparing it against setpoint data to determine disturbance data, and using this information to adjust actuation values for subsequent iterations. This closed-loop feedback mechanism enables progressive refinement of processing conditions while maintaining manageable system complexity through iterative learning
2Manufacturing precision
If the system implements real-time disturbance compensation during each recipe operation iteration, then manufacturing precision improves, but the processing time and productivity decrease
Solution Approach 1:
The system performs disturbance compensation calculations in advance during idle time between substrate batches, rather than during active processing. By determining actuation values based on previous iteration data before the next substrate enters the processing chamber, the system maintains high precision while avoiding delays to production throughput
Solution Approach 2:
The system implements disturbance compensation at periodic intervals between substrate processing iterations rather than continuously during each operation. This allows the system to maintain precision through regular compensation updates while preserving productivity by avoiding continuous intervention during active processing cycles
3Measurement precision
If the system uses detailed sensor data from the first iteration to calculate disturbance data, then the measurement precision improves, but the loss of time for data processing increases
Solution Approach 1:
The system processes only the essential disturbance data elements that have the greatest impact on processing quality, rather than analyzing all available sensor data in full detail. By focusing computational resources on the most critical parameters for disturbance compensation, the system achieves sufficient measurement precision while minimizing data processing time and maintaining high throughput
Data Source
AI summary
A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.