Substrate Region Positioning With Region-Specific Alignment Models
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional exposure apparatuses face challenges in achieving high overlay accuracy between layers due to the use of a single calculation method for positioning regions on a substrate, which may not be optimal for all regions, leading to potential defects and low yield in chip production.
Innovation Solution
A method is introduced where different calculation methods, such as cubic and quintic polynomial models, are applied to each region on the substrate to estimate its position, with the optimal method selected based on comparison with actual positions, allowing for customized alignment corrections.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single calculation method is applied to the entire substrate, then the processing is simple and fast, but the alignment accuracy is not optimal for all regions
Solution Approach 1:
The patent applies different calculation methods to different regions of the substrate based on their specific characteristics. Each region is assigned a calculation method that is most suitable for its local properties, thereby optimizing alignment accuracy for each region rather than using a one-size-fits-all approach.
Solution Approach 2:
The substrate is divided into multiple regions, and each region is processed independently with its own selected calculation method. This segmentation allows the system to handle complex alignment requirements by breaking down the overall problem into smaller, region-specific subproblems.
2Manufacturing precision
If multiple calculation methods are prepared and selected for each region, then the alignment accuracy improves, but the processing time and complexity increase
Solution Approach 1:
The patent performs preliminary evaluation of multiple calculation methods for each region before actual alignment processing. By pre-assessing which calculation method is most suitable for each region based on available data, the system avoids time-consuming trial-and-error during the actual alignment process, thus reducing overall processing time while maintaining high accuracy.
Solution Approach 2:
Each region effectively selects its own optimal calculation method based on its characteristics and the evaluation results. This self-service approach allows the system to automatically optimize alignment parameters for each region without requiring manual intervention or complex centralized decision-making, thereby reducing processing time.
Data Source
AI summary
A method for obtaining a position of each of a plurality of regions on a substrate, including calculating an estimated position using each of a plurality of different calculation methods from position measurement data of a mark provided in a sample region of the plurality of regions, for each of the plurality of regions, obtaining a comparison result of comparing the estimated position of each of the plurality of regions calculated in the calculating and an actual position of each of the plurality of regions, for each of the plurality of calculation methods, and selecting the calculation method used to calculate the estimated position of the region from the plurality of calculation methods based on the comparison result obtained in the obtaining, for each of the plurality of regions.