Substrate Processing System with Reversing Device for Surface Orientation
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Solution Overview
Problem
The management of front and rear surface states of substrates becomes complicated when handling both substrates with their front surfaces facing upward and rear surfaces facing upward in existing substrate processing systems, as these systems often require complex handling and processing unit configurations.
Innovation Solution
A substrate processing system is designed with separate processing blocks for front and rear surface processing, each equipped with dedicated transfer devices and reversing devices to manage the substrate states efficiently, ensuring that substrates are processed without both surfaces being handled simultaneously, thereby simplifying state management.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If both front surface processing units and rear surface processing units are provided in the substrate processing system, then the system can process substrates with different surface orientations, but the management of substrate front/rear surface states becomes complicated
Solution Approach 1:
The substrate processing system is divided into separate processing blocks (first processing block for front surface processing, second processing block for rear surface processing). Each block has dedicated transfer devices that handle substrates in specific orientations, thereby segmenting the complex task of dual-orientation processing into manageable, specialized units that reduce state management complexity
Solution Approach 2:
A reversing device is introduced as an intermediary component on the transfer path between processing blocks. This reversing device changes the orientation of substrates as needed, acting as a mediator that enables substrates to transition between front-surface-up and rear-surface-up states while maintaining organized flow and reducing management complexity
2Adaptability or versatility
If substrates are transferred between processing units with different orientations, then comprehensive processing is enabled, but the risk of contamination increases
Solution Approach 1:
By segmenting the system into dedicated processing blocks for front surface and rear surface processing, substrates are handled in controlled, orientation-specific environments. This segmentation reduces the risk of contamination by limiting exposure to potential contaminants and maintaining dedicated clean zones for each surface type
Solution Approach 2:
The reversing device serves as an intermediary that enables orientation changes in a controlled manner. By providing a dedicated mechanism for flipping substrates between orientations, it reduces the risk of contamination compared to manual or ad-hoc orientation changes, as the reversing device can be designed with appropriate contamination prevention measures
Data Source
AI summary
A substrate processing system includes a first processing block, a second processing block, and a reversing device. The first processing block includes a first processing unit configured to perform a process on a substrate with a first surface of the substrate facing upward, and a first transfer device configured to carry the substrate into/from the first processing unit. The second processing block includes a second processing unit configured to perform a process on the substrate with a second surface of the substrate, which is opposite to the first surface, facing upward, and a second transfer device configured to carry the substrate into/from the second processing unit. The reversing device is provided on a transfer path of the substrate from the first processing block to the second processing block, and is configured to reverse the substrate.