Substrate Rotation Stage Layout for Clean Upside-Down Processing
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Solution Overview
Problem
Existing substrate processing technologies face challenges in preventing contamination of substrates during processing, especially when turning substrates upside down, which can expose active surfaces to particles and damage them.
Innovation Solution
A substrate rotating apparatus is designed with vertically arranged stages and a rotary driver that can turn the stages upside down, featuring inclined lower and upper support surfaces to prevent contamination and protect the active surface of the substrate, allowing for simultaneous upside-down rotation of multiple substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If substrates are turned upside down during processing, then processing efficiency is improved, but substrate contamination with particles increases
Solution Approach 1:
The support members are designed with locally differentiated functions: the first support member has a support surface for supporting the substrate, while the second support member has a support surface inclined at an acute angle. This local quality differentiation allows the substrate to be supported in a manner that prevents particle contamination while maintaining processing efficiency.
Solution Approach 2:
The second support member with the inclined support surface acts as an intermediary element between the substrate and the processing environment. This intermediary structure prevents direct contact between the substrate and potential contamination sources while still providing necessary support during the upside-down processing operation.
2Speed
If substrates are turned upside down during processing, then processing speed is improved, but risk of substrate damage increases
Solution Approach 1:
Different support members provide different support characteristics: the first support member provides stable support during normal handling, while the second support member with its inclined surface provides controlled support during upside-down processing. This local quality differentiation ensures substrate integrity is maintained throughout the processing cycle.
Solution Approach 2:
The support system is designed to dynamically adapt to different processing orientations. The inclined support surface of the second support member becomes active during upside-down processing, providing appropriate support characteristics that prevent substrate damage while enabling fast processing.
3Productivity
If multiple substrates are processed simultaneously, then productivity is improved, but complexity of the processing system increases
Solution Approach 1:
The first and second support members are integrated into a single support structure that can simultaneously handle multiple substrates. This merging of support functions allows multiple substrates to be processed at once without requiring separate complex support systems for each substrate.
Solution Approach 2:
The support structure is designed with universal functionality to handle substrates in multiple orientations and configurations. The inclined support surface can accommodate substrates whether they are upright or upside down, allowing the same structure to serve multiple processing needs without increasing complexity.
Data Source
AI summary
Disclosed are substrate rotating apparatuses, substrate processing systems, and substrate processing methods. The substrate rotating apparatus comprises vertically arranged stages and a rotary driver that turns the stages upside down. The stage includes a lower support assembly and an upper support assembly adjacent to the lower support assembly. The lower support assembly includes a lower support member having a lower support surface that supports one surface of a substrate. The upper support assembly includes upper support members. The upper support members are spaced apart from each other in a horizontal direction. A substrate placement space is between the upper support members. The upper support member includes an upper support surface that supports another surface of the substrate. The upper support surface is inclined toward the substrate placement space and makes an acute angle with the horizontal direction.


