Substrate Treatment Chamber Sealing via Ultra-Fast Fluid Pressurization
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Solution Overview
Problem
The existing substrate treatment processes face challenges in maintaining a sealed environment due to O-ring deformation or damage, leading to potential defects in the substrate treating process.
Innovation Solution
A substrate treatment apparatus and method that utilize an upper and lower body with a seal between them, a fluid supply unit with multiple auxiliary fluid supply units to control fluid flow rates, and a controller to manage the fluid flow for ultra-high-speed pressurization, ensuring the seal is deformed to maintain the substrate treating space from the outside.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If a single fluid supply unit is used, then the device complexity is reduced, but the pressurization speed is insufficient to rapidly deform the seal
Solution Approach 1:
The fluid supply unit is divided into multiple auxiliary fluid supply units (first, second, third) that can operate independently or in combination. Each unit contributes to the overall pressurization process, enabling ultra-high-speed pressurization by simultaneously supplying fluid through multiple channels to rapidly deform the seal.
2Speed
If fluid flows at high rate through a single supply unit, then pressurization speed increases, but fluid flow distribution becomes uneven causing seal deformation issues
Solution Approach 1:
The fluid supply is segmented into multiple auxiliary units with different flow rates. The first auxiliary fluid supply unit supplies fluid at a first flow rate, the second at a second flow rate, and the third at a third flow rate. This segmentation allows balanced distribution of fluid flow across different regions of the seal, ensuring uniform deformation while achieving ultra-high pressurization speed.
Solution Approach 2:
Each auxiliary fluid supply unit is configured to supply fluid at a specific flow rate tailored to its location and function. The controller opens these units at different timings to provide localized fluid flow control, ensuring that each region of the seal receives appropriate fluid pressure for uniform deformation.
3Reliability
If the seal is made more rigid to maintain sealing, then sealing reliability improves, but the seal cannot deform quickly enough for ultra-high-speed pressurization
Solution Approach 1:
The seal is designed with dynamic characteristics that allow it to deform rapidly in response to fluid pressure while maintaining sealing reliability. The seal includes a tube space that facilitates quick deformation, and the multi-unit fluid supply system dynamically controls fluid flow to achieve ultra-high-speed pressurization without compromising sealing performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively maintains a sealed substrate treating space, preventing external contamination and ensuring the integrity of the substrate treatment process, thereby reducing the risk of defects.
Implementation Method 1
a first auxiliary fluid supply unit configured to control the fluid to flow at a first flow rate and a second auxiliary fluid supply unit configured to the fluid to flow at a second flow rate different from the first flow rate
Implementation Method 2
A pressure of the fluid flowing into the substrate treating space acts on the seal to deform a contact surface of the seal subjected to the pressure such that the substrate treating space is sealed from an outside by the deformed seal
Data Source
AI summary
Apparatus and Method for treating substrate, are provided. A substrate treatment apparatus includes an upper body, a lower body coupled to the upper body and defining a substrate treating space therebetween, a seal disposed between the upper body and the lower body, wherein the seal seals the substrate treating space from an outside, a fluid supply unit configured to supply fluid to the substrate treating space and a controller. The fluid supply unit includes a first auxiliary fluid supply unit configured to control the fluid to flow at a first flow rate and a second auxiliary fluid supply unit configured to the fluid to flow at a second flow rate different from the first flow rate. The controller is configured to control the first auxiliary fluid supply unit and the second auxiliary fluid supply unit such that the fluid flows into the substrate treatment space through the first auxiliary fluid supply unit and the second auxiliary fluid supply unit in an ultra-high-speed pressurizing step, during at least one time interval.