Substrate Spinner Splash Guard With Centrifugal Liquid Guidance
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Solution Overview
Problem
Existing substrate processing technologies face challenges in efficiently managing the scattering of chemical liquids during substrate processing, particularly due to varying rotation speeds, and require a solution that prevents scattering while avoiding complex structures and increased costs.
Innovation Solution
An apparatus with a scattering prevention module that includes a support portion, a body portion, and a movable portion capable of variable movement based on centrifugal force, guiding scattered chemical liquids with increased movement as the substrate rotates, and accommodating the liquids in a bowl system with gaps for efficient discharge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate rotation speed is increased to improve processing efficiency, then productivity is improved, but chemical liquid scattering increases
Solution Approach 1:
The scattering prevention module employs a movable portion that can dynamically change its position and orientation in response to substrate rotation speed. As the substrate rotates faster and scatters more chemical liquid, the movable portion adjusts its angle and position to optimize the guidance path for the scattered liquid, allowing the system to maintain high productivity while effectively preventing scattering at each rotation speed level.
2Device complexity
If a fixed structure is used for the scattering prevention module, then device complexity is reduced, but it cannot respond to varying scattering degrees at different rotation speeds
Solution Approach 1:
The scattering prevention module incorporates a movable portion that can change its configuration based on substrate rotation speed. The module transitions from a static structure to a dynamic one where the movable portion adjusts its position and angle to match the scattering characteristics at different rotation speeds, providing adaptability without requiring a completely complex reconfigurable system.
Solution Approach 2:
The system implements feedback control where the substrate rotation speed is monitored and used to control the position and orientation of the movable portion in the scattering prevention module. This feedback mechanism allows the module to automatically adapt to varying scattering conditions without manual intervention, achieving versatility through a relatively simple controlled movement system.
3Object-generated harmful factors
If a movable portion with variable movement is added to guide scattered chemical liquid, then chemical liquid scattering is prevented, but device complexity increases
Solution Approach 1:
The scattering prevention module uses a movable portion that can change its position and orientation to effectively guide scattered chemical liquid. The movable portion is designed to perform variable movement that corresponds to the scattering pattern, allowing the system to prevent chemical liquid scattering while maintaining relatively simple module architecture through purposeful dynamic adjustment rather than complex multi-component systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively prevents chemical liquid scattering by adapting to varying rotation speeds, ensuring efficient discharge and reducing installation complexity and costs through a foldable structure with movable members that enhance movement in response to centrifugal force.
Implementation Method 1
a movable portion provided at an upper portion of the body portion and configured to perform the variable movement... the movable portion may guide the chemical liquid scattered from the substrate by performing the variable movement based on the centrifugal force
Data Source
AI summary
Provided is an apparatus for processing a substrate. The apparatus for processing a substrate includes a base portion configured to provide a rotational force in a circumferential direction; a holding module located on the base portion and configured to hold the substrate; a nozzle module located above the base portion and configured to jet a chemical liquid onto the substrate on the holding module; and a scattering prevention module located on the base portion at a peripheral portion of the holding module and configured to, when the chemical liquid is scattered after being jetted onto the substrate, guide the scattered chemical liquid to be discharged, wherein the scattering prevention module guides the scattered chemical liquid with a variable movement caused by the rotational force.