Substrate Stage Alignment via Gap Width Measurement
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Solution Overview
Problem
The non-uniform width of the gap between the stage and the processing container in substrate processing apparatuses leads to non-uniform gas flow and processing results, which is addressed by adjusting the stage's position to ensure uniform gap width.
Innovation Solution
A method involving a sensor to measure the gap width at multiple locations, calculate the central position, and adjust the stage's position using a drive mechanism to align it with the central axis, ensuring uniform gap width.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the stage position is not adjusted, then the apparatus structure is simple, but the gap width is non-uniform causing non-uniform gas flow and processing results
Solution Approach 1:
The patent performs preliminary measurement of the gap width at multiple locations using a sensor before the actual substrate processing. The measured data is used to calculate the stage's central position and determine the necessary adjustment, ensuring uniform gap width is achieved before processing begins. This preliminary action allows the system to prepare the correct stage position in advance.
Solution Approach 2:
The patent employs a feedback mechanism where the sensor continuously or periodically measures the gap width, the control unit processes this information to calculate the stage's central position, and the drive mechanism adjusts the stage position accordingly. This closed-loop feedback system ensures the gap width remains uniform throughout the processing operation.
2Measurement precision
If manual adjustment methods are used, then the device complexity is low, but the measurement precision and processing consistency are insufficient
Solution Approach 1:
The patent replaces manual mechanical measurement methods with an automated sensor-based measurement system. The sensor electronically measures the gap width at multiple locations, and a control unit automatically calculates the stage's central position and controls the drive mechanism for positioning. This substitution of mechanical manual measurement with electronic sensing and automated control significantly improves measurement precision and processing consistency.
3Stability of the object's composition
If the stage position is not optimized, then the operation is simple, but the gas flow becomes non-uniform affecting processing quality
Solution Approach 1:
The patent implements a self-service adjustment system where the sensor automatically measures the gap width, the control unit independently calculates the stage's central position based on the measured data, and the drive mechanism autonomously adjusts the stage position. This self-service capability eliminates the need for manual intervention in the measurement and adjustment process, ensuring stable and uniform gas flow while simplifying the overall operation.
Data Source
AI summary
A substrate processing apparatus includes: a stage having a placement surface; a processing container having a vertically-extending central axis and a cylindrical interior space in which the stage is disposed with a gap provided around the stage; a drive mechanism for moving the stage at least horizontally; and a sensor for measuring a width of the gap in a first horizontal direction intersecting the gap. An adjustment method includes: measuring widths of the gap at at least three locations on the stage by the sensor while moving the stage in a second horizontal direction perpendicular to the first horizontal direction by the drive mechanism; calculating a central position of the stage based on the widths of the gap measured at the at least three locations; and adjusting a horizontal position of the stage by the drive mechanism so that the central position of the stage is located on the central axis.