Rotating Substrate Stage Preheating for Stable Cryogenic Processing
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Solution Overview
Problem
Existing substrate processing methods require a significant amount of time for the substrate to reach a steady cooling temperature during ultra-low temperature processing, especially when rotating the substrate, due to inefficient temperature management and monitoring during the cooling process.
Innovation Solution
A method involving preheating the stage to a steady cooling temperature using a dummy wafer or a heater before processing, followed by continuous processing of actual wafers, to rapidly stabilize the stage temperature.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If the stage is cooled directly without preheating to reach steady cooling temperature, then the substrate can be processed at ultra-low temperature, but the time required for the substrate to reach steady cooling temperature is excessively long
Solution Approach 1:
The stage is preheated to a predetermined temperature (e.g., room temperature or higher) before substrate processing begins. This preliminary heating action ensures that when the cooling process starts, the stage and substrate can rapidly reach the steady cooling temperature, significantly reducing the time required compared to direct cooling from ambient conditions.
2Productivity
If the substrate temperature is not stabilized before processing, then processing can begin immediately, but the processing quality and uniformity deteriorate
Solution Approach 1:
A temperature detection mechanism continuously monitors the stage temperature during the cooling process. When the temperature reaches the predetermined steady cooling temperature, the system receives feedback and automatically notifies the controller to begin substrate processing. This feedback control ensures that processing only starts when temperature uniformity is achieved, guaranteeing processing quality while optimizing productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the time required for the stage to reach the steady cooling temperature, allowing for more precise temperature management and efficient processing of multiple substrates.
Implementation Method 1
a frozen heat transfer body disposed at a center of a back surface of a stage with a gap interposed therebetween... supplying cold heat of a chiller to the stage via the frozen heat transfer body while supplying a cooling gas to the gap between the rotating stage and the frozen heat transfer body
Implementation Method 2
preheating a stage on which a substrate is to be placed such that a temperature of the stage reaches a steady cooling temperature within a fixed range
Data Source
AI summary
There is provided a method for processing a substrate, comprising: preparing a substrate processing device including a rotatable stage on which a substrate is placed, a frozen heat transfer body fixed on a backside of the stage with a gap interposed therebetween and cooled to an extremely low temperature, a gas supply mechanism configured to supply to the gap a cooling gas for transferring a cold heat of the frozen heat transfer body to the stage, a rotation mechanism configured to rotate the stage, and a processing mechanism configured to process the substrate; preheating the stage such that a temperature of the stage reaches a steady cooling temperature within a fixed range; and after preheating, continuously processing a plurality of substrates by the processing mechanism while rotating the stage that has reached the steady cooling temperature in a state where a substrate having a specific temperature higher than or equal to room temperature is placed on the stage.