Substrate Stage Deviation Measurement Using Rotational Position Detection

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Solution Overview

Problem

In substrate processing apparatuses, relative positional deviations between substrate stages and substrates occur due to installation errors and thermal expansion, making accurate measurement challenging with visual confirmation, especially in multi-substrate processing environments where it is time-consuming and inaccurate.

Innovation Solution

A method involving detecting the initial and final positions of substrates after rotation by a predetermined angle, calculating positional deviations of substrate stages using sensors and rotational data, and adjusting positions automatically to correct deviations without exposing the processing container to air.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If visual confirmation is used to measure positional deviation, then the measurement method is simple, but the measurement precision and productivity deteriorate due to time-consuming manual operations and inaccuracy

Engineering Contradiction:
Improvepositional deviation measurement accuracyVSAvoidmeasurement time
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent replaces manual visual confirmation with an automated detection system using sensors (such as cameras or position sensors) to detect substrate positions. The detection unit automatically captures position information of substrates on the substrate stage, eliminating the need for manual visual measurement and significantly improving both measurement precision and productivity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The system performs self-measurement of positional deviations by automatically detecting substrate positions, calculating deviations from intended positions, and identifying affected substrates without requiring external manual intervention. The substrate processing apparatus autonomously completes the entire measurement and identification process.

Inventive Principle:
Principle #25Self-service

2Measurement precision

If visual confirmation is used to measure positional deviation, then no additional equipment is needed, but the measurement precision deteriorates due to human error and the process becomes time-consuming

Engineering Contradiction:
Improvepositional deviation measurement accuracyVSAvoiddetection system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The detection unit is designed to serve multiple functions: detecting substrate positions, calculating positional deviations, identifying affected substrates, and providing data for correction processes. This multi-functional design reduces the need for separate specialized devices while maintaining high measurement precision.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent introduces a detection unit as an intermediary between the substrate stage and the control system. This intermediary automatically captures position data and transmits it to the control unit for processing, eliminating the need for direct human visual measurement while keeping the overall system architecture relatively simple.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Productivity

If manual measurement methods are used, then the device complexity is low, but the productivity and measurement precision deteriorate due to time-consuming operations

Engineering Contradiction:
Improvemeasurement and correction speedVSAvoidautomatic detection and correction system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent merges the detection function, calculation function, and correction control function into an integrated system. The detection unit, control unit, and substrate stage work together as a unified automated system that simultaneously performs measurement and initiates correction, significantly improving productivity while managing device complexity through functional integration.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The system performs preliminary detection of substrate positions and calculation of positional deviations before the actual substrate processing begins. This preliminary measurement allows the system to prepare correction data in advance, enabling rapid response and correction during the processing operation, thereby improving overall productivity.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS20240145278A1Method of measuring positional deviation of substrate stage and substrate processing apparatus
Publication Date: 2024.05.02 TOKYO ELECTRON LTD
  • US20240145278A1 patent drawing
  • US20240145278A1 patent drawing
  • US20240145278A1 patent drawing

AI summary

A method of measuring a positional deviation of a substrate stage in a substrate processing apparatus provided rotatably inside a processing container, includes: detecting an initial position of a substrate transferred by an arm that transfers the substrate; placing the substrate on the substrate stage; rotating the substrate by a predetermined rotational angle by rotating the substrate stage; delivering the substrate after rotation from the substrate stage to the arm; detecting a position of the substrate after rotation transferred by the arm; and calculating the positional deviation amount of the substrate stage with respect to the initial position of the substrate based on the initial position of the substrate, the position of the substrate after rotation, and the rotational angle.