Substrate Standby Stage Layout for Faster Batch-to-Single Wafer Transfer

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Solution Overview

Problem

Existing substrate processing systems face inefficiencies in transitioning between batch and single-wafer processing, leading to reduced throughput and increased processing time.

Innovation Solution

A substrate processing system with a loading/unloading section, batch processing section, single-wafer processing section, and integrated substrate transfer and standby sections, including a first and second standby region with a first and first movement device to efficiently transfer substrates between these sections, utilizing a first processing liquid supply on the second standby region.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If substrates are transferred sequentially between batch processing section and single-wafer processing section, then device complexity is reduced, but productivity decreases due to increased transfer time

Engineering Contradiction:
ImprovethroughputVSAvoidsubstrate transfer time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The standby stage is arranged vertically between the batch processing section and single-wafer processing section, utilizing the vertical dimension for substrate storage. This allows substrates to be positioned in three-dimensional space rather than requiring horizontal arrangement, enabling parallel access from both processing sections and reducing transfer time without increasing horizontal device footprint.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

Substrates are pre-positioned on the standby stage in regions vertically adjacent to both the batch processing section and single-wafer processing section before being needed. This preliminary positioning allows immediate transfer to either processing section without intermediate handling steps, reducing the time substrates spend in transit and improving overall throughput.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If separate transport devices are used for batch and single-wafer processing, then reliability of each processing line is improved, but device complexity increases

Engineering Contradiction:
Improveprocessing line reliabilityVSAvoidtransport device complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The standby stage serves multiple functions: it acts as a substrate storage location for the batch processing section, a transfer point for the single-wafer processing section, and a buffer that decouples the two processing lines. This multi-functional design eliminates the need for separate dedicated transport devices for each processing line, reducing overall device complexity while maintaining the reliability of both processing streams through independent access paths.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Manufacturing precision

If substrates are processed one by one in single-wafer section, then manufacturing precision is improved, but productivity decreases

Engineering Contradiction:
Improvesubstrate processing precisionVSAvoidprocessing throughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The vertical arrangement of the standby stage with regions adjacent to both processing sections enables the single-wafer processing section to access substrates immediately from the standby stage without waiting for batch processing to complete. This spatial configuration allows high-precision single-wafer processing to proceed in parallel with batch processing, maintaining manufacturing precision while improving overall throughput by eliminating sequential dependencies.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS20250210391A1Substrate processing system and substrate processing method
Publication Date: 2025.06.26 TOKYO ELECTRON LTD
  • US20250210391A1 patent drawing
  • US20250210391A1 patent drawing
  • US20250210391A1 patent drawing

AI summary

A substrate processing system includes: a loading/unloading section that loads and unloads a cassette accommodating a plurality of substrates; a batch processing section that collectively processes the substrates; a single-wafer processing section that processes the substrates one by one; a substrate transfer section that transfers the substrates from the loading/unloading section to the batch processing section and the single-wafer processing section; and a substrate standby section that transfers the substrates from the batch processing section to the single-wafer processing section. The substrate standby section includes: a standby stage including a first standby region and a second standby region; a first transport device that collectively transports the substrates from the batch processing section to the first standby region; and a first movement device that moves the substrates from the first standby region to the second standby region. The second standby region includes a first processing liquid supply.