Substrate Support Layout for Uniform Supercritical Drying Flow
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Solution Overview
Problem
Existing substrate drying processes using supercritical fluids face issues with non-uniform fluid flow on substrates due to obstruction by the substrate support, leading to uneven drying and fluid distribution.
Innovation Solution
A substrate processing apparatus and method that includes a chamber design with a first and second substrate support, where the second support is positioned to allow for uniform fluid flow by being larger than the center base surface and smaller than the groove base surface, and a lifting mechanism to move the second body between open and closed positions for seamless substrate transfer and treatment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the substrate support is positioned to support the edge region of the substrate, then the substrate is securely held during treatment, but the support obstructs the flow of fluid and prevents uniform drying
Solution Approach 1:
The substrate support is divided into two distinct parts: a first substrate support for loading/unloading and a second substrate support for treatment. This segmentation allows each part to be optimized for its specific function without interfering with fluid flow during the treatment phase.
Solution Approach 2:
The second substrate support is designed to be movable, allowing it to be positioned only when needed for treatment. During fluid flow and drying operations, the support can be repositioned or removed to eliminate obstruction and ensure uniform fluid distribution across the substrate surface.
2Ease of operation
If the substrate support structure is added to hold the substrate, then substrate positioning is improved, but the support creates obstruction to fluid flow
Solution Approach 1:
The support system is segmented into multiple independent components (first substrate support, second substrate support, holder with rods) that can be independently positioned and controlled. This allows the system to provide positioning when needed while minimizing obstruction during fluid flow operations.
Solution Approach 2:
The holder with rods acts as an intermediary structure that connects the substrate to the movable support, allowing for flexible positioning and adjustment. This intermediary enables precise substrate placement while maintaining open fluid flow paths.
3Stability of the object's composition
If the chamber is designed with fixed substrate support, then structural stability is improved, but fluid flow uniformity deteriorates
Solution Approach 1:
The chamber incorporates movable substrate supports that can dynamically adjust their position based on the operational phase. During treatment, the supports are positioned to enable uniform fluid flow, while during loading/unloading, they provide stable substrate holding. This dynamic adaptability resolves the conflict between structural stability and fluid flow uniformity.
Solution Approach 2:
The position and configuration of substrate supports are changed as parameters depending on the operational phase. By adjusting support position, height, and orientation, the system maintains chamber structural integrity while optimizing fluid flow characteristics for uniform drying.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design ensures that the substrate is uniformly dried and achieves a substrate that allows for uniform fluid flow and supports the substrate to allow for uniform fluid flow and supports the substrate to allow for uniform fluid distribution, resulting in a uniform fluid flow and supports the substrate to allow for uniform fluid distribution, ensuring consistent drying across the substrate surface.
Implementation Method 1
a lifting member for moving the second body relative to the first body, and the lifting member moves the second body between an open position and a closed position
Implementation Method 2
the drying process is carried out by supplying a fluid containing carbon dioxide (CO2) in a supercritical state, or by supplying the fluid in a gaseous state and then changing the phase to a supercritical state to remove the volatile organic compound remaining on the substrate
Implementation Method 3
supplying the fluid in a gaseous state and then changing the phase to a supercritical state
Implementation Method 4
a second substrate support which is placed in the treatment space and supports the substrate while the substrate is being treated in the treatment space
Data Source
AI summary
Provided is an apparatus for processing a substrate. The apparatus includes: a first body; a second body that is combined with the first body to define the treatment space; a lifting unit for moving the second body between an open position and a closed position; and a first substrate support installed in the first body and a second substrate support installed in the second body, in which a groove is formed in an edge region of a lower wall of the second body, and the first substrate support is positioned in the groove when the second body moves to the closed position. According to an embodiment of the present invention, when the substrate is dried, the substrate may be uniformly treated by uniformly forming a flow of a fluid flowing on the substrate.