Immersion Lithography Substrate Support for Peripheral Fluid Extraction
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Solution Overview
Problem
The fast relative movement between the substrate and the confined immersion liquid in lithographic apparatuses leads to leaking of the immersion fluid, causing defects on the substrate and limiting the throughput due to the need for slower scanning speeds.
Innovation Solution
A substrate support system with a first support body, a separate main body equipped with a thermal conditioner, and an extractor body surrounding the main body, featuring a first extraction channel to remove fluid from the peripheral part of the substrate, allowing for easier maintenance and replacement of worn components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate is moved at high speed relative to the projection system, then the throughput of the lithographic apparatus is improved, but the immersion fluid leaks from the localized area causing defects on the substrate
Solution Approach 1:
The substrate support is divided into a modular structure with a first support body that can be separately replaced. This segmentation allows maintenance and replacement of worn components without replacing the entire substrate support system, thereby reducing downtime and maintaining high throughput while ensuring consistent fluid containment performance
Solution Approach 2:
The patent employs dynamic sealing mechanisms and fluid handling structures that adapt to high-speed substrate movement. The modular first support body is designed to work with dynamic sealing solutions that prevent fluid leakage during rapid scanning and stepping operations, enabling high throughput without compromising substrate quality
2Manufacturing precision
If the immersion fluid is confined to a localized area between the projection system and the substrate, then the resolution of smaller features is improved, but the fluid leaks during fast relative movement
Solution Approach 1:
The patent introduces intermediate fluid handling structures and sealing mechanisms between the projection system and substrate. These intermediary elements maintain the immersion fluid in the localized area during high-speed operations, ensuring both improved feature resolution through immersion lithography and reliable fluid containment without leakage
3Productivity
If the substrate support is used for an extended period, then the productivity is maintained, but the support body wears out and requires replacement
Solution Approach 1:
The substrate support is segmented into a replaceable first support body and a permanent main body. This allows the worn first support body to be replaced independently after extended use, maintaining productivity while managing wear-related reliability issues through targeted component replacement rather than complete system replacement
Solution Approach 2:
The modular first support body is designed to be discarded and replaced when worn, while the main body is recovered and retained. This approach maintains continuous productivity by enabling quick replacement of worn components while recovering and reusing the durable main body structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces downtime and maintenance costs by enabling quicker replacement of worn parts, improving thermal control, and minimizing fluid leaks, thus enhancing the throughput and accuracy of the lithographic process.
Implementation Method 1
a main body separate from the first support body and configured to support the first support body, the main body comprising a thermal conditioner configured to thermally condition the main body, and/or the support body and/or the substrate
Implementation Method 2
an extractor body surrounding the main body and the support body, wherein the extractor body comprises a first extraction channel configured to extract fluid from near a peripheral part of the substrate
Data Source
AI summary
A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.