Substrate Support Gas Channel Layout for Edge Deposition Uniformity
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Solution Overview
Problem
Substrate processing systems face challenges with deposition nonuniformities due to the presence of pockets on substrate supports, which disrupt the flow of process gases and cause uneven deposition at the substrate's edge.
Innovation Solution
The substrate support incorporates multiple channels and plenums to supply dedicated flows of different process gases or gas mixtures to the backside edge and pockets of the substrate, allowing separate control over gas distribution to different regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If pockets are added to the substrate support to receive the carrier ring, then substrate transfer is facilitated, but deposition nonuniformity increases due to disrupted gas flow
Solution Approach 1:
The gas distribution system is segmented into multiple independent channels: a first channel supplies process gas mixture to the backside edge of the substrate, while a second channel supplies process gas to the pockets. This segmentation allows each channel to be optimized for its specific function, maintaining deposition uniformity while supporting substrate transfer operations.
Solution Approach 2:
Different regions of the substrate support are provided with different gas supply characteristics. The backside edge receives process gas mixture from the first channel, while the pockets receive process gas from the second channel. This local differentiation addresses the specific needs of each region, preventing deposition nonuniformity despite the presence of pockets.
2Manufacturing precision
If multiple gas channels are added to supply separate gas flows to different regions, then deposition uniformity is improved, but device complexity increases
Solution Approach 1:
The first and second channels are integrated into a single baseplate structure, sharing common structural support and fabrication processes. This merging approach reduces overall device complexity while maintaining the functional separation needed for uniform deposition.
Solution Approach 2:
The baseplate serves multiple functions: it provides structural support for the substrate support, contains the gas distribution channels, and facilitates both substrate transfer (via pockets) and uniform deposition (via separate gas channels). This multi-functionality reduces the need for additional separate components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances deposition uniformity by enabling precise control of gas flows, reducing nonuniformities and improving the consistency of deposition processes.
Implementation Method 1
a first channel routed through the baseplate and arranged to supply a process gas mixture comprising at least a first process gas and a second process gas to a backside edge of a substrate disposed on the substrate support, and a second channel routed through the baseplate and arranged to supply, separate from the first channel, one of the first process gas and the second process gas to the at least one pocket defined in the first surface of the baseplate
Data Source
AI summary
A substrate support includes at least three pockets defined along a perimeter of the substrate support, an edge gas groove located on a top surface of the substrate support, and a first clamping groove located radially inward from the edge gas groove on the top surface of the substrate support. Each pocket comprises a narrow portion and a wide portion located radially outward from the narrow portion. The edge gas groove is concentric with the substrate support. The edge gas groove intersects the narrow portion of each pocket. At least thirty through holes are within the edge gas groove and at least one through hole is within the narrow portion of each pocket.