Substrate Support Leveling for Showerhead Alignment and Sealing

Solution Overview

Problem

Misalignment of the substrate support in substrate processing chambers leads to uneven processing and compromised seals, affecting product quality and yield, as well as the waste of processing gases and deposition of contaminants.

Innovation Solution

A leveling system comprising an adapter plate, frame, lift guide, and carrier plate, with adjustable leveling units, allows for precise orientation of the seal and support plates relative to the showerhead and liner assembly, ensuring proper alignment and sealing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the substrate support is moved to the raised position for processing, then substrate processing can be performed, but misalignment between the substrate and showerhead occurs resulting in uneven processing

Engineering Contradiction:

Improvesubstrate processing capabilityVSAvoidsubstrate-showerhead alignment

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The patent introduces adjustable leveling units that allow the substrate support structure to be dynamically adjusted for alignment. The leveling units enable modification of the orientation of the support plate and seal plate relative to the showerhead and liner assembly, ensuring proper alignment when the substrate support is in the raised processing position.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The patent changes the orientation parameters of the substrate support components by adjusting the leveling units. This allows modification of the angular position and tilt of the support plate and seal plate to achieve parallel alignment with the showerhead and proper sealing contact with the liner assembly.

Inventive Principle:

Principle #35Parameter changes

2Productivity

If the substrate support is moved to the raised position for processing, then substrate processing can be performed, but the seal between the seal plate and chamber component is compromised

Engineering Contradiction:

Improvesubstrate processing capabilityVSAvoidseal integrity

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent introduces adjustable leveling units that allow the substrate support structure to be dynamically adjusted for alignment. The leveling units enable modification of the orientation of the support plate and seal plate relative to the showerhead and liner assembly, ensuring proper alignment when the substrate support is in the raised processing position.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The patent performs alignment adjustment of the seal plate orientation relative to the liner assembly before processing operations. By adjusting the leveling units to establish proper alignment and sealing contact in advance, the system prevents gas leakage and contaminant deposition during subsequent processing operations.

Inventive Principle:

Principle #10Preliminary action

Data Source

PatentUS20250308862A1Leveling systems and methods

Publication Date: 2025.10.02 APPLIED MATERIALS INC

AI summary

A substrate support of a processing chamber includes a support plate and a seal plate. The processing chamber includes a leveling system configured to raise and lower the support plate and the seal plate. The leveling system is configured to alter an orientation of the seal plate with respect to a chamber component, such as a liner assembly. The leveling system is configured to alter an orientation of the support plate with respect to a chamber component, such as a showerhead.