Lithography Substrate Support Lifting Mechanism
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Solution Overview
Problem
Lithography systems require compact designs to minimize space in costly clean rooms, and existing substrate support structures are inefficient in loading and unloading substrates, which complicates substrate handling and increases space requirements.
Innovation Solution
A substrate support structure with a lifting mechanism that moves the substrate in a combination of perpendicular and parallel movements to the support surface, allowing for efficient loading and unloading without obstructing the substrate's path, thereby reducing the space needed for substrate handling apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If conventional ejector pin mechanisms are used for substrate loading and unloading, then substrate handling is achieved, but the substrate handling apparatus requires excessive space and the system becomes more complex
Solution Approach 1:
The lifting mechanism is integrated directly into the substrate support structure, merging the support function and lifting function into a single unified structure. This eliminates the need for separate lifting apparatus and reduces the space required for substrate handling operations.
Solution Approach 2:
The substrate support structure serves multiple functions: it provides structural support for the substrate during processing and simultaneously acts as the lifting mechanism for loading and unloading operations. This multi-functionality reduces the overall complexity and space requirements of the system.
2Reliability
If conventional substrate support structures are used, then substrate support is provided, but the loading and unloading process is inefficient and complicates substrate handling
Solution Approach 1:
The substrate support structure incorporates a movable lifting mechanism that can dynamically adjust its position to enable efficient loading and unloading operations. The lifting face can move between a retracted position during processing and an extended position for substrate removal, optimizing both support reliability and handling efficiency.
3Area of stationary object
If the substrate support is positioned farther from the substrate handling apparatus, then there is sufficient space for conventional mechanisms, but the system requires more clean room space and is less efficient
Solution Approach 1:
The lifting mechanism is nested within the substrate support structure itself, with the lifting face contained within or integrated into the support structure. This nesting allows the lifting functionality to be compact and eliminates the need for additional external apparatus, reducing clean room space requirements while maintaining efficient substrate handling.
Data Source
AI summary
A substrate support, configured to support a substrate during a process within a lithography system, includes a lifting structure configured to move the substrate between a first position, in which a lifting face of the lifting structure supports the substrate at a position set apart from a support surface of the substrate support, and a second position, in which the lifting structure does not prevent the substrate from being supported by a support surface of the substrate support; wherein, in moving between the first and second positions, the substrate moves in a combination of movement substantially perpendicular to a plane parallel to the support surface and movement substantially parallel to the support surface.