Substrate Support Guide Member for Low-Particle Chamber Coupling
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Solution Overview
Problem
Existing substrate treating apparatuses face challenges such as particle generation within the treatment space, difficulty in replacing support unit components, and adjusting the horizontality of the support unit.
Innovation Solution
The apparatus includes a support unit with a support pin coupled to the process chamber and a guide member extending laterally to support the substrate. The guide member includes a contact portion that can be polished to ensure horizontal alignment of the substrate. This configuration minimizes particle generation, facilitates component replacement, and allows for easy adjustment of the support unit's horizontality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a support unit is coupled to the process chamber using bolts and similar components, then the support unit can be securely fixed, but particles are generated within the treatment space
Solution Approach 1:
The patent removes bolts and similar fastening components from the support unit structure. Instead, the support unit utilizes a clamp-like configuration where the process chamber itself acts as the fastening element, eliminating particle-generating components from the treatment space
Solution Approach 2:
The patent introduces a clamp mechanism that mediates between the support unit and the process chamber. The clamp engages with the chamber's opening/closing structure, using the chamber's own movement mechanism as the fastening intermediary rather than introducing separate bolt-based fastening systems
2Stability of the object's composition
If the support unit components are fixed in place, then structural stability is maintained, but it becomes difficult to replace components
Solution Approach 1:
The support unit is divided into separable components including the clamp mechanism and the support plate. These segmented components can be independently removed and replaced while maintaining structural stability during operation through the clamp's engagement with the process chamber
Solution Approach 2:
The support unit incorporates dynamic elements that allow for easy assembly and disassembly. The clamp mechanism can be opened and closed to facilitate component replacement, providing both stability during operation and ease of maintenance when needed
3Strength
If the support unit structure is fixed and rigid, then structural integrity is ensured, but adjusting the height and horizontality becomes difficult
Solution Approach 1:
The support unit incorporates adjustable elements including height adjustment mechanisms and horizontality adjustment features. These dynamic components allow the rigid support structure to be configured and adjusted during installation or maintenance while maintaining structural integrity during operation
Solution Approach 2:
The support unit allows for parameter adjustments including height position and horizontality angle. These parameters can be modified through built-in adjustment mechanisms while the overall structural integrity is maintained through the rigid clamp and support plate design
Data Source
AI summary
The present invention provides an apparatus for treating a substrate, including: a process chamber including a first body and a second body which are combined with each other to form a treatment space for treating a substrate is treated therein; a driver which moves the process chamber to an open position or a close position; a support unit which supports a substrate within the treatment space; and a fluid supply unit which supplies a fluid to the treatment space, in which the support unit includes: a support pin coupled to the first body or the second body; and a guide member which is coupled to the support pin and extends in a lateral direction of the support pin to support the substrate.