Substrate Support Inserts for In-Situ Film Growth and Temperature Measurement
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Solution Overview
Problem
Existing semiconductor processing systems face challenges in accurately measuring properties such as film growth rates and substrate temperatures due to sensor drift caused by hardware aging, window coating, and non-emissive energy effects, which can lead to inaccurate measurements and require time-consuming manual calibration.
Innovation Solution
A substrate support assembly with integrated measurement regions and sensors, including crystalline silicon carbide inserts, allows for in-situ monitoring of film growth rates and substrate temperatures using a combination of temperature sensors, growth rate sensors, and band edge detectors, facilitated by a controller with machine learning algorithms for calibration and optimization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If traditional sensors are used for measuring film growth rates and substrate temperatures, then the measurement system is simple, but sensor drift occurs due to hardware aging and window coating leading to inaccurate measurements
Solution Approach 1:
The patent introduces measurement regions with known optical properties (crystalline silicon carbide) as intermediary reference targets. These regions serve as stable reference points that do not suffer from the same drift issues as traditional sensors, allowing for accurate measurements by comparing against the known properties of the measurement regions.
Solution Approach 2:
The patent creates optical copies or representations of the measurement regions by detecting emitted energy characteristics. Instead of directly measuring physical quantities with drifting sensors, the system captures optical signatures (spectral characteristics) of the measurement regions which can be compared against reference data to determine actual process parameters.
2Measurement precision
If manual calibration methods are used to correct sensor drift, then the measurement accuracy can be restored, but machine downtime increases and calibration becomes time-consuming
Solution Approach 1:
The patent enables continuous calibration by incorporating measurement regions directly into the substrate support structure. This allows calibration measurements to be performed continuously during normal operation without requiring machine shutdown or manual intervention, maintaining measurement accuracy throughout the process.
Solution Approach 2:
The measurement regions automatically provide reference signals for calibration purposes. The system self-calibrates by continuously comparing sensor readings against the known optical properties of the measurement regions, eliminating the need for external calibration operations and reducing machine downtime.
3Loss of information
If multiple sensors are placed at different locations to monitor process parameters, then comprehensive measurement coverage is achieved, but the complexity of the measurement system increases
Solution Approach 1:
The measurement regions serve multiple functions: they act as reference targets for calibration, provide spatial reference for positioning, and enable measurements of multiple parameters (temperature, growth rate, emissivity) from a single integrated structure. This multi-functionality reduces the need for separate measurement systems at multiple locations.
Solution Approach 2:
The patent combines multiple measurement capabilities into integrated measurement regions that are built into the substrate support. Instead of using separate sensors and reference targets distributed throughout the chamber, the measurement regions consolidate calibration and measurement functions into a unified structure.
4Measurement precision
If energy from non-emissive sources is not accounted for, then the measurement system is simpler, but measurement accuracy deteriorates due to erroneous energy readings
Solution Approach 1:
The measurement regions are designed with specific local optical properties (known emissivity and reflectivity characteristics) that differ from the surrounding substrate areas. This local differentiation allows the system to distinguish between energy emitted by the measurement regions and energy from other sources, enabling accurate discrimination of measurement signals.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances measurement accuracy and reduces machine downtime by enabling continuous, automated calibration and monitoring of film growth rates and substrate temperatures, improving the precision and efficiency of semiconductor processing.
Implementation Method 1
energy received that is not due to emissivity can affect accuracy of measurements
Data Source
AI summary
Embodiments of the present disclosure relate to measurement substrates and substrate support assemblies for property measurements. In one or more embodiments, a substrate support assembly includes a substrate support, and a first insert sized and shaped for positioning in a first opening of the substrate support. The first insert includes a first measurement region.