Semitransparent Substrate Support for Microwave Degas Uniformity

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Solution Overview

Problem

Conventional substrate supports in microwave degas chambers fail to provide adequate temperature uniformity, leading to uneven heating and potential contamination due to residual gases in semiconductor substrate processing.

Innovation Solution

A substrate support system comprising a susceptor with high thermal conductivity and a metal foil to disperse microwave radiation, ensuring uniform heating of the substrate, with a support plate and susceptor design that includes openings for support features and a metal foil placement between the susceptor and microwave source.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If conventional substrate supports are used in microwave degas chambers, then the structure is simple, but temperature uniformity is inadequate

Engineering Contradiction:
Improvetemperature uniformityVSAvoidsubstrate support structure
Core Design Contradiction:
TemperatureVSDevice complexity

Solution Approach 1:

The substrate support uses a composite structure combining a susceptor material (such as silicon carbide or graphite) with high thermal conductivity integrated into the support plate. This composite material approach enables uniform temperature distribution across the substrate while maintaining structural integrity and microwave compatibility.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The susceptor is positioned specifically at the substrate-contact region where thermal uniformity is most critical. This localized application of high thermal conductivity material optimizes temperature distribution where needed most, rather than requiring the entire support structure to be complex.

Inventive Principle:
Principle #3Local quality

2Productivity

If microwave heat sources are used to degas substrates quickly, then processing speed increases, but temperature uniformity deteriorates

Engineering Contradiction:
Improvedegas processing speedVSAvoidtemperature uniformity
Core Design Contradiction:
ProductivityVSTemperature

Solution Approach 1:

The susceptor acts as an intermediary between the microwave radiation and the substrate. It absorbs microwave energy and distributes it uniformly through thermal conduction, enabling rapid heating while maintaining temperature uniformity across the substrate surface.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

By selecting susceptor materials with specific thermal conductivity parameters (high thermal conductivity), the system achieves rapid energy transfer from microwave source to substrate while maintaining uniform temperature distribution, thus improving processing speed without sacrificing uniformity.

Inventive Principle:
Principle #35Parameter changes

3Loss of time

If conventional heating elements are used, then the device complexity is low, but processing time increases

Engineering Contradiction:
Improvedegas processing timeVSAvoidheating system
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The patent replaces conventional mechanical heating elements (hot plates, resistive heaters) with a microwave-based heating system using a susceptor. This substitution enables volumetric heating throughout the substrate, dramatically reducing processing time while the susceptor design maintains structural simplicity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution achieves more uniform temperature distribution across the substrate, enhancing the degassing process and reducing contamination risks by ensuring consistent heating with the microwave radiation.

Implementation Method 1

the susceptor includes one or more openings; wherein the one or more support features extend through corresponding ones of the one or more openings

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 2

a metal foil disposed beneath a side of the susceptor facing the support plate

Methodology Applied
Scientific EffectMicrowave radiation absorption and dispersion: Microwave Radiation

Implementation Method 3

a microwave source coupled to the chamber body and configured to supply microwave radiation to heat the substrate

Methodology Applied
Scientific EffectMicrowave heating: Microwave Radiation

Data Source

PatentUS20220406643A1Semitransparent substrate support for microwave degas chamber
Publication Date: 2022.12.22 APPLIED MATERIALS INC
  • US20220406643A1 patent drawing
  • US20220406643A1 patent drawing
  • US20220406643A1 patent drawing

AI summary

Embodiments of substrate supports for use in microwave degas chambers are provided herein. In some embodiments, a substrate support for use in a microwave degas chamber includes a support plate having one or more support features for supporting a substrate; a susceptor comprising a plate disposed on the support plate, wherein the susceptor includes one or more openings, wherein the one or more support features extend through corresponding ones of the one or more openings; and a metal foil disposed beneath a side of the susceptor facing the support plate.