Gas-Rotated Substrate Support With Pyrometer Speed Detection
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Solution Overview
Problem
In reaction chambers with gas flow rotation, particularly in 'hot-wall' chambers, estimating the rotation speed of substrate support devices with high precision is challenging due to factors like deposits on the device and positioning changes, especially at high temperatures.
Innovation Solution
The use of an optical-thermal device, such as a pyrometer, to detect the periodic temperature variations caused by the rotation of a substrate support device, allowing for the calculation of rotation speed based on the period of these variations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If gas flow rotation is used to rotate the substrate support device, then the device complexity is reduced and ease of operation is improved, but the measurement precision of rotation speed deteriorates
Solution Approach 1:
The patent replaces mechanical rotation measurement systems with optical detection. A pyrometer or optical sensor detects temperature variations or reflective properties of the rotating substrate support device, converting mechanical rotation into optical signals for precise non-contact measurement of rotation speed.
Solution Approach 2:
The patent introduces an intermediary detection system (pyrometer or optical sensor) that indirectly measures rotation speed by detecting temperature variations or optical properties of the rotating device, rather than directly measuring mechanical rotation parameters.
2Measurement precision
If mechanical rotation is used to rotate the substrate support device, then the measurement precision of rotation speed is improved, but the device complexity and ease of manufacture worsen
Solution Approach 1:
The patent replaces complex mechanical rotation drive systems with simpler gas flow-driven rotation, while using optical detection systems to maintain precise measurement of rotation speed without mechanical coupling.
Solution Approach 2:
The substrate support device rotates itself under the action of gas flow without external mechanical drive, eliminating the need for complex mechanical transmission systems while maintaining controllable rotation through gas flow parameters.
3Ease of operation
If gas flow rotation is used in hot-wall reaction chambers, then the ease of operation is improved, but the reliability of rotation speed estimation deteriorates due to deposits and positioning changes
Solution Approach 1:
The patent uses optical detection systems (pyrometers) that are not affected by deposits on the substrate support device, providing reliable rotation speed measurement through non-contact temperature or optical property detection that remains accurate despite chamber conditions.
Solution Approach 2:
The patent implements feedback control by continuously monitoring rotation speed through optical detection and adjusting gas flow parameters to maintain desired rotation speed, compensating for variations caused by deposits or positioning changes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables precise determination of the rotation speed of substrate support devices in high-temperature environments, improving the uniformity of semiconductor material deposition.
Implementation Method 1
the use of an optical-thermal device, such as a pyrometer, to detect the periodic temperature variations caused by the rotation of a substrate support device
Implementation Method 2
a disc-shaped element adapted to receive a gas flow to rotate about an axis
Data Source
AI summary
The device (420) is for supporting substrates in a reaction chamber of an epitaxial reactor; it comprises: a disc-shaped element (422) having a first face (422A) adapted to be upperly positioned when the device (420) is being used and a second face (422B) adapted to be lowerly positioned when the device (420) is being used, said disc-shaped element (422) being adapted to receive a gas flow (F) to rotate the device (420) about an axis (X) thereof, a substrate-supporting element (424) in a single piece with said disc-shaped element (422) and preferably adjacent to said first face (422A), and a shaft (426) coaxial to said disc-shaped element (422), in a single piece with said disc-shaped element (422) and having a first end (426A) at said second face (422B); said shaft (426) has at a second end (426B) thereof at least a protrusion (428A, 428B, 428C) whose rotation is adapted to be detected by a pyrometer (430) or a thermographic camera.


