Multi-Zone Substrate Support Heating for CD Uniformity During Transients

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Solution Overview

Problem

Substrate processing systems face challenges with critical dimension non-uniformity (CD NU) due to local temperature variations during transient periods before substrates reach steady-state temperature, leading to increased cycle times and costs.

Innovation Solution

A substrate processing system with multi-zone substrate supports and a controller that adjusts heating based on average heat functions determined during transient periods, using different heater adjustment parameters for each treatment step to reduce CD NU.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the substrate waits to reach steady-state temperature before processing, then temperature uniformity is improved, but cycle time increases

Engineering Contradiction:

Improvetemperature uniformityVSAvoidcycle time

Core Design Contradiction:

Manufacturing precisionVSLoss of time

Solution Approach 1:

The system performs preliminary temperature mapping during a transient period to determine average heat functions before actual substrate processing. This preliminary characterization enables subsequent processing to occur during transient periods without compromising temperature uniformity, as the pre-determined heat functions compensate for transient temperature variations

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The system changes the operational parameters by utilizing transient temperature periods instead of waiting for steady-state. The controller adjusts heater zone parameters dynamically based on the determined average heat functions, allowing processing to occur during transient periods while maintaining effective temperature control through parameter modulation

Inventive Principle:

Principle #35Parameter changes

2Productivity

If processing occurs during transient temperature period, then cycle time is reduced, but critical dimension non-uniformity increases

Engineering Contradiction:

ImprovethroughputVSAvoidcritical dimension uniformity

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The system implements feedback by using the determined average heat functions to continuously adjust heater zone parameters during transient processing. The controller monitors the transient temperature evolution and modulates heating in real-time based on the pre-characterized heat functions, ensuring that critical dimension uniformity is maintained despite transient temperature variations

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The system applies local quality control by independently adjusting the heating of each heater zone based on its specific average heat function. This localized control allows different regions of the substrate to receive tailored heating adjustments during transient periods, compensating for spatial variations in heat transfer and maintaining uniform critical dimensions across the substrate

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces critical dimension non-uniformity by optimizing heating during transient periods, thereby decreasing cycle times and improving throughput without compromising processing quality.

Implementation Method 1

a substrate support including a plurality of heater zones arranged in the processing chamber

Methodology Applied

Scientific EffectHeating: Heating

Implementation Method 2

a plasma generator configured to generate plasma in the processing chamber

Methodology Applied

Scientific EffectPlasma generation: Plasma

Data Source

PatentUS20250279299A1Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports

Publication Date: 2025.09.04 LAM RES CORP

AI summary

A substrate processing system includes a processing chamber, a substrate support including a plurality of heater zones arranged in the processing chamber, a gas delivery system configured to deliver process gases to the processing chamber, and a controller configured to communicate with the gas delivery system and the plurality of heater zones, initiate a first treatment step of a process during a transient temperature period after a substrate is arranged on the substrate support and prior to the substrate reaching a steady-state temperature of the substrate support, and adjust heating to each of the plurality of heater zones during the first treatment step based on average heat functions determined for corresponding ones of the plurality of heater zones during a period corresponding to the first treatment step.