Substrate Surface Blocking for Selective Insulating Film Growth

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Solution Overview

Problem

Existing substrate processing methods fail to selectively form films on different surfaces of substrates, leading to unwanted film formation on inappropriate surfaces due to non-specific adsorption of catalyst components.

Innovation Solution

A substrate processing method involving a catalyst component supplying process, a film-forming component supplying process, and an inhibition component supplying process, where the inhibition component is adsorbed on specific surfaces before the catalyst component, preventing its adsorption and allowing selective film formation on desired surfaces using organic compounds like self-assembled monolayers and silane-based materials.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a catalyst component is supplied to a substrate without surface treatment, then the catalyst component adsorbs on the substrate surface, but film formation occurs on unwanted surfaces due to non-specific adsorption

Engineering Contradiction:
Improvefilm formation selectivityVSAvoidnon-specific adsorption
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The inhibition component is supplied to the substrate surface before the catalyst component to pre-establish selective adsorption sites. This preliminary action modifies the substrate surface properties, creating specific regions that will either attract or repel the catalyst component, thereby preventing non-specific adsorption and ensuring film formation only on desired surfaces.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The inhibition component acts as an intermediary substance between the substrate and the catalyst component. By introducing this intermediate layer, the patent controls the interaction between the catalyst and substrate, enabling selective film formation through controlled adsorption inhibition on specific surfaces while allowing catalyst adsorption on other surfaces.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If an inhibition component is supplied to inhibit catalyst adsorption, then selective film formation is enabled, but the process complexity increases due to additional supplying steps

Engineering Contradiction:
Improvesurface control accuracyVSAvoidprocess steps
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent combines the inhibition component supplying process with the existing catalyst component supplying process into a unified sequential operation. By integrating these steps into a coordinated process flow where the inhibition component is supplied first followed by the catalyst component, the patent achieves selective film formation while managing process complexity through systematic combination of operations.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the selective formation of insulating films on specific surfaces of substrates by inhibiting catalyst component adsorption, ensuring precise film deposition and maintaining film quality and adhesion, while allowing for adjustable film thickness and accurate surface control.

Implementation Method 1

an inhibition component supplying process of supplying an inhibition component, which is to be adsorbed on the substrate and inhibits adsorption of the catalyst component on the substrate

Methodology Applied
Scientific EffectAdsorption: Adsorption

Implementation Method 2

a catalyst component supplying process of supplying a catalyst component, which is to be adsorbed on a substrate, to the substrate

Methodology Applied
Scientific EffectAdsorption: Adsorption

Implementation Method 3

a film-forming component supplying process of supplying a film-forming component, which forms an insulating film on the substrate in the presence of the catalyst component

Methodology Applied
Scientific EffectChemical Vapour Deposition: Chemical Vapour Deposition

Data Source

PatentUS20230411146A1Substrate processing method and substrate processing device
Publication Date: 2023.12.21 TOKYO ELECTRON LTD
  • US20230411146A1 patent drawing
  • US20230411146A1 patent drawing
  • US20230411146A1 patent drawing

AI summary

A substrate processing method includes: a catalyst component supplying process of supplying a catalyst component, which is to be adsorbed on a substrate, to the substrate; a film-forming component supplying process of supplying a film-forming component, which forms an insulating film on the substrate in the presence of the catalyst component, to the substrate; and an inhibition component supplying process of supplying an inhibition component, which is to be adsorbed on the substrate and inhibits adsorption of the catalyst component on the substrate, to a front surface or a back surface of the substrate, wherein the inhibition component supplying process is performed before the catalyst component supplying process.