Substrate Table Cleaning Pad With Adjustable Pressure Control
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Solution Overview
Problem
The contamination of substrate tables in photolithography tools affects the accurate focus of light onto substrates during the alignment and exposure step, leading to inaccuracies in the transfer of patterns, as contaminants prevent the substrate from lying flat on the table.
Innovation Solution
A portable handheld cleaning device with an adjustable weight system and a cleaning pad equipped with pyramid-shaped grits is used to evenly distribute pressure and effectively remove contaminants from the substrate table surface, ensuring uniform cleaning without damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a cleaning device is used to remove contaminants from the substrate table, then the cleanliness of the substrate table is improved, but the complexity of the cleaning system increases
Solution Approach 1:
The cleaning device is divided into separate functional modules: a handheld cleaning head with pyramid-shaped grits, an adjustable weight system, and a portable design. This segmentation allows the cleaning function to be performed by a simple, modular device rather than a complex integrated system, resolving the contradiction between effective contamination removal and system complexity.
Solution Approach 2:
The cleaning device uses passive gravity-based pressure application through adjustable weights, eliminating the need for complex active pressure control systems. The pyramid-shaped grits self-adjust to surface contours, providing automatic adaptation without complex control mechanisms, thus reducing system complexity while maintaining effective cleaning.
2Productivity
If pressure is applied to remove contaminants, then cleaning effectiveness is improved, but the risk of damaging the substrate table surface increases
Solution Approach 1:
The cleaning surface features pyramid-shaped grits with specific geometric properties that concentrate cleaning action on contaminant particles while distributing pressure locally to avoid surface damage. The localized pyramid structure provides aggressive contaminant removal at contact points while the overall pressure distribution remains controlled, resolving the contradiction between cleaning effectiveness and surface protection.
Solution Approach 2:
The adjustable weight system allows dynamic modification of the pressure parameter applied during cleaning. Operators can adjust the weight to match the contamination level and surface sensitivity, enabling effective contaminant removal while preventing surface damage by keeping pressure within safe limits. This parameter adjustability resolves the contradiction between cleaning effectiveness and surface protection.
3Manufacturing precision
If uniform pressure distribution is achieved during cleaning, then cleaning uniformity is improved, but the complexity of pressure control increases
Solution Approach 1:
The flat base design of the cleaning head creates an equipotential pressure distribution across the cleaning surface. When combined with adjustable weights, this ensures uniform pressure application without requiring complex active pressure control systems. The geometry itself provides the pressure uniformity, resolving the contradiction between cleaning uniformity and control complexity.
Solution Approach 2:
The pyramid-shaped grits on the cleaning surface automatically adapt to the substrate table contours, self-regulating the pressure distribution. This self-adjusting mechanism provides uniform cleaning pressure without complex control systems, as the geometry of the grits naturally distributes pressure evenly across the contact area, resolving the contradiction between cleaning uniformity and device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device ensures the substrate table is thoroughly cleaned, allowing for accurate light focus and pattern transfer by maintaining even pressure distribution, thus enhancing the precision of the photolithography process.
Implementation Method 1
a cleaning pad equipped with pyramid-shaped grits is used to evenly distribute pressure and effectively remove contaminants from the substrate table surface
Data Source
AI summary
A portable handheld cleaning device is provided capable of cleaning the surface of the substrate table without damaging the surface. The portable handheld cleaning device in accordance with the present disclosure includes a base having a first side and a second side (the first side and the second side overlapping each other), a hollow structure on the first side of the base, and a weight holding space within the hollow structure. A grinding pad is provided on the second side of the base. The grinding pad includes a cleaning surface, the cleaning surface having a plurality of substantial pyramid shaped grits.