Substrate Table Cleaning Pad With Adjustable Pressure Balance
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Solution Overview
Problem
The contamination of substrate tables in photolithography tools affects the accurate focus of light onto semiconductor substrates, leading to inaccuracies in the transfer of patterns during the photolithography process.
Innovation Solution
A portable handheld cleaning device with adjustable weight members and a cleaning pad, and an automated cleaning device with feedback circuitry, are used to efficiently remove contaminants from substrate tables, ensuring even pressure distribution and targeted cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a portable handheld cleaning device with adjustable weight members is used, then cleaning effectiveness and even pressure distribution are improved, but device complexity increases
Solution Approach 1:
The cleaning device incorporates adjustable weight members that can be positioned to counterbalance the cleaning head, enabling the operator to maintain consistent pressure on the substrate table surface throughout the cleaning process. The weights compensate for the weight of the cleaning head and allow precise control of downforce distribution.
Solution Approach 2:
The cleaning device features adjustable and repositionable weight members that can be dynamically configured based on the specific cleaning requirements, substrate table size, and contamination distribution. This dynamic adjustability allows optimization of pressure distribution for different cleaning scenarios.
2Measurement precision
If an automated cleaning device with feedback circuitry is used, then cleaning precision and contamination detection are improved, but device complexity and cost increase
Solution Approach 1:
The automated cleaning device incorporates feedback circuitry that includes sensors (such as optical sensors, capacitive sensors, or force sensors) to detect the presence, location, and characteristics of contaminants on the substrate table. The system uses this feedback information to adjust cleaning parameters, guide the cleaning head to specific locations, and monitor cleaning effectiveness in real-time.
Solution Approach 2:
The automated cleaning device performs self-diagnosis and self-adjustment through the feedback circuitry, which automatically detects contamination patterns and adjusts the cleaning process without requiring manual intervention. The system can identify areas requiring additional cleaning passes and autonomously reposition the cleaning head.
3Manufacturing precision
If adjustable weight members are incorporated for even pressure distribution, then cleaning uniformity is improved, but device complexity increases
Solution Approach 1:
The weight system is divided into multiple adjustable weight members that can be independently positioned along the cleaning device structure. This segmentation allows fine-tuning of pressure distribution across different zones of the substrate table surface, enabling uniform cleaning even on large or irregularly shaped tables.
Solution Approach 2:
The adjustable weight members enable local adjustment of pressure applied to specific areas of the substrate table. Operators can concentrate weight in areas with heavy contamination or adjust distribution to match the specific geometry and contamination patterns of different substrate tables.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The cleaning devices effectively maintain the cleanliness of substrate tables, ensuring accurate light focus and pattern transfer, thereby enhancing the precision of the photolithography process.
Implementation Method 1
a grinding pad (120) provided on the second side of the base
Implementation Method 2
The weight members (130) are configured to provide a substantial even pressure to the grinding pad (120)
Implementation Method 3
The weight members (130) are configured to provide a substantial even pressure to the grinding pad (120)
Data Source
AI summary
A portable handheld cleaning device is provided capable of cleaning the surface of the substrate table without damaging the surface. The portable handheld cleaning device in accordance with the present disclosure includes a base having a first side and a second side (the first side and the second side overlapping each other), a hollow structure on the first side of the base, and a weight holding space within the hollow structure. A grinding pad is provided on the second side of the base. The grinding pad includes a cleaning surface, the cleaning surface having a plurality of substantial pyramid shaped grits.