Substrate Processing Tank Zoning for Uniform Liquid Temperature
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in achieving uniform temperature distribution and control within processing tanks, leading to inefficiencies and processing faults during batch processing of substrates.
Innovation Solution
The apparatus incorporates multiple liquid supplies with heating devices and in-tank temperature sensors to measure and adjust temperature at multiple positions, allowing for precise control of temperature distribution and zone-specific processing conditions, enhancing controllability and yield.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single heating device and single temperature sensor are used in the processing tub, then the device complexity is reduced, but the temperature uniformity and controllability across multiple substrates deteriorates
Solution Approach 1:
The processing tub is divided into multiple zones, each equipped with its own heating device and temperature sensor. This segmentation allows independent temperature control for each zone, ensuring uniform temperature distribution across all substrates while maintaining manageable system complexity through modular design
Solution Approach 2:
Each zone within the processing tub is equipped with localized heating and sensing capabilities, enabling different temperature control strategies for different spatial regions. This local quality approach ensures that each substrate receives optimal temperature conditions specific to its position, improving overall temperature uniformity
2Manufacturing precision
If multiple liquid supplies with heating devices are added to control temperature at multiple positions, then the temperature controllability is improved, but the device complexity increases
Solution Approach 1:
The liquid supply system is designed to serve multiple functions: it provides both cooling and heating capabilities through a single integrated infrastructure. The supply lines can deliver processed liquid for cooling or heated liquid for temperature maintenance, reducing the need for separate dedicated systems for each function and position
Solution Approach 2:
Each temperature zone is equipped with feedback control through temperature sensors that continuously monitor conditions and adjust heating device output accordingly. This closed-loop feedback mechanism improves temperature controllability while preventing the need for excessive manual adjustment mechanisms, thereby managing system complexity
3Manufacturing precision
If temperature is controlled at multiple positions with multiple sensors, then the processing precision is improved, but the ease of operation deteriorates
Solution Approach 1:
The temperature control system operates autonomously with each zone's heating device automatically adjusting based on its local temperature sensor readings. The system self-regulates without requiring manual intervention for each position, maintaining high processing precision while preserving ease of operation through automated control
Solution Approach 2:
Automated feedback control loops continuously monitor temperature at each position and adjust heating accordingly, eliminating the need for manual temperature management at multiple positions. This automation maintains high processing precision while significantly improving ease of operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution improves temperature controllability and processing efficiency by allowing for targeted adjustments to temperature and flow rates, reducing processing faults and improving substrate yield.
Implementation Method 1
a heating device configured to heat the processing liquid at a portion of the supply line
Implementation Method 2
multiple in-tank temperature sensors configured to measure a temperature of the processing liquid at multiple positions within the water tank of the processing tub
Data Source
AI summary
A substrate processing apparatus includes a processing tub configured to store therein a processing liquid in which multiple substrates are to be immersed; multiple liquid supplies each of which includes a supply line through which the processing liquid is supplied to an inside of a water tank of the processing tub and a heating device configured to heat the processing liquid at a portion of the supply line; and multiple in-tank temperature sensors configured to measure a temperature of the processing liquid at multiple positions within the water tank of the processing tub.


