Substrate Transfer Arm Curved Path for Compact Footprint
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Solution Overview
Problem
The existing substrate processing apparatuses face challenges in scaling up or down without increasing the width of the apparatus, as the substrate support position affects the collision risk with gate valves during linear transfer, and changing gate valve angles is difficult due to other component arrangements.
Innovation Solution
The apparatus features a transfer chamber row with rotatable and extensible/contractible transfer arms and processing chambers positioned to minimize the footprint by aligning the substrate support closer to the transfer chamber row, allowing the transfer arm to pass along the outer side of lines connecting the rotation axes and gate valves, controlled by a driving mechanism and controller to prevent collisions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the substrate support position is positioned closer to the transfer chamber row to minimize apparatus width, then the apparatus footprint is reduced, but the risk of collision between the substrate and gate valves increases during linear transfer
Solution Approach 1:
The substrate transfer path is changed from a straight line to a curved arc path. The transfer arm rotates about its rotation axis while extending, causing the substrate to follow a curved trajectory that passes through the gate valve opening without collision. This curvature allows the substrate to clear the gate valve structure while maintaining a compact apparatus footprint.
Solution Approach 2:
The transfer motion is transformed from one-dimensional linear movement to two-dimensional arc motion by combining rotation and extension of the transfer arm. This dimensional change enables the substrate to navigate around the gate valve obstacle in the vertical plane while maintaining horizontal compactness.
2Reliability
If the gate valve angle is adjusted to prevent substrate collision, then collision risk is reduced, but the difficulty of installation and maintenance increases due to other component arrangements
Solution Approach 1:
Instead of using a fixed gate valve angle that requires complex installation arrangements, the system employs a dynamic transfer arm mechanism that can rotate and extend to adapt its transfer path. This dynamic adjustment of the transfer trajectory eliminates the need for specialized gate valve orientations, simplifying installation and maintenance while preventing collisions.
3Device complexity
If the transfer arm uses only linear extension to move the substrate, then the transfer mechanism is simpler, but the apparatus cannot be scaled down without increasing collision risk
Solution Approach 1:
The transfer mechanism merges rotation and extension motions into a single coordinated action. The transfer arm both rotates about its axis and extends simultaneously, combining two degrees of freedom into one integrated mechanism that achieves compact substrate transfer without requiring separate rotational and linear actuators.
Data Source
AI summary
A substrate processing apparatus includes a transfer chamber row of transfer chambers arranged linearly, a processing chamber row of processing chambers arranged on one side or both sides of the transfer chamber row, a driving mechanism for rotating/extending/contracting a transfer arm of a substrate transfer mechanism in each transfer chamber, and a controller. A center of a substrate supporting region in the processing chamber is positioned closer to the transfer chamber row than a line connecting a rotation axis of the transfer arm and a center of a gate valve. Further, when loading and unloading a substrate between the processing chamber and the adjacent transfer chamber, the controller controls the driving mechanism such that a center of the substrate held by the transfer arm passes along an outer side of a line that connects a rotation axis of the transfer arm and a center of a substrate supporting region.