Substrate Transfer Robot Arm for Particle Reduction
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Solution Overview
Problem
Conventional in-line type multi-chamber substrate processing apparatuses face challenges with increased complexity and longer evacuating times due to large transfer chamber sizes, which require larger robots and are prone to particle contamination from film peeling on substrate trays during transfer.
Innovation Solution
A substrate processing apparatus with a transfer robot having a rotatable arm that maintains a fixed length, allowing for simplified substrate transfer between chambers without a tray, reducing film peeling and enabling more processing chambers with a less complex mechanism.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the number of processing chambers is increased to improve productivity, then productivity is improved, but the circumferential length of the transfer chamber increases, resulting in longer evacuating time and larger apparatus size
Solution Approach 1:
The transfer chamber is divided into multiple smaller transfer chambers arranged in parallel, each handling substrate transfer to/from a processing chamber. This segmentation allows each transfer chamber to maintain a compact size with short evacuating time while the system collectively supports multiple processing chambers for high productivity.
Solution Approach 2:
Instead of arranging transfer chambers in a single large circumferential loop, the invention transitions to a multi-dimensional parallel configuration where multiple small transfer chambers are distributed across different locations. This dimensional reorganization reduces the path length and volume of each individual transfer chamber while maintaining system capacity.
2Adaptability or versatility
If the circumferential length of the transfer chamber is increased to accommodate more processing chambers, then more processing chambers can be installed, but the size of the transfer chamber becomes large, requiring a larger transfer robot and increasing mechanical complexity
Solution Approach 1:
The transfer function is segmented across multiple small transfer chambers, each with its own compact transfer robot. This eliminates the need for one large transfer robot with complex mechanics, while still providing adaptability to handle multiple processing chambers through the distributed parallel configuration.
Solution Approach 2:
Each transfer chamber is designed to handle substrate transfer partially (to/from one processing chamber), rather than requiring one robot to perform excessive action across the entire circumferential path. This partial action approach simplifies the mechanical design of each transfer robot while achieving system versatility through parallel operation.
3Ease of operation
If a substrate tray is used for substrate transfer, then substrate can be transferred between chambers, but film peeling occurs on the substrate tray, generating particle contamination
Solution Approach 1:
The substrate tray is extracted and removed from the transfer mechanism. Instead of transferring substrates on trays that contact surfaces, the invention uses a tray-less transfer system where substrates are held by a transfer robot and moved through vacuum ports directly between chambers, eliminating the source of film peeling contamination.
Solution Approach 2:
The transfer robot arm acts as an intermediary mechanism, holding and transporting substrates without requiring contact with tray surfaces. This intermediary approach enables substrate transfer while avoiding the film peeling issue that occurs when substrates rest on trays during transfer operations.
Data Source
AI summary
The present invention provides an in-line type multi-chamber substrate processing apparatus which, with a simple configuration, can decrease influence of particles due to film peeling and enables installation of a number of processing chambers. In one embodiment of the present invention, a jointless arm of a transfer robot that has a substrate holding part 4a and performs rotational movement while maintaining a predetermined length of the arm is disposed inside a first process chamber capable of being evacuated. The first process chamber is configured to be able to transfer substrates from an adjacent second process chamber through an opening by the arm of the transfer robot. A holder as an arm retreating position and a substrate mounting position is positioned so as to overlap with a trajectory of the substrate holding part when the arm of the transfer robot rotates about a rotation axis.