Substrate Transfer Position Control for Centered Stage Placement
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Solution Overview
Problem
Current substrate transfer systems face challenges in accurately placing substrates at the centers of stages in process modules, leading to potential clearance issues and uneven substrate processing due to assembly errors and varying stage center distances.
Innovation Solution
A method of controlling the substrate transfer system involves acquiring process module-specific substrate transfer positions for each atmospheric and vacuum transfer device, allowing the vacuum transfer devices to place substrates at the centers of stages, and adjusting the atmospheric transfer device's positions to ensure accurate placement and secure clearances, thereby improving substrate processing uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If substrates are transferred using conventional transfer devices without process module-specific position adjustment, then the transfer operation is simple, but the substrate placement precision at stage centers deteriorates due to assembly errors and varying stage center distances
Solution Approach 1:
The control device acquires and stores process module-specific substrate transfer positions in advance, before actual substrate transfer operations begin. These positions are predetermined based on each process module's stage center location, allowing the atmospheric transfer device to directly execute precise transfers without real-time calculations or adjustments.
Solution Approach 2:
The system incorporates detection devices that measure the actual positions of stages in each process module, providing feedback information about stage center locations. This feedback is used by the control device to calculate and determine accurate process module-specific substrate transfer positions, ensuring substrates are placed precisely at stage centers despite assembly variations.
2Stability of the object's composition
If the atmospheric transfer device uses fixed transfer positions, then the device operation is simple, but the substrate clearance uniformity across different process modules deteriorates due to varying stage center distances
Solution Approach 1:
The system transitions from fixed, static transfer positions to dynamic, process module-specific transfer positions. The control device selects different transfer positions based on the target process module, allowing the atmospheric transfer device to adapt its transfer parameters to each module's specific geometry and stage center location, thereby maintaining uniform substrate clearances across all modules.
Solution Approach 2:
The system changes the transfer position parameters specific to each process module rather than using a single fixed parameter set. By acquiring and applying process module-specific substrate transfer positions, the system adjusts critical parameters (transfer location coordinates) to compensate for variations in stage center distances, ensuring consistent substrate clearances despite structural variations among process modules.
Data Source
AI summary
Provided is a method of controlling a substrate transfer system transferring substrates by controlling a first transfer device and a second transfer device comprising: a process of acquiring process module-specific substrate transfer positions for each of the plurality of process modules, wherein the process module-specific substrate transfer positions are substrate transfer positions of the mounting parts of the first transfer device for allowing the second transfer device to place substrates at centers of the stages, the second transfer device transferring substrates from the mounting parts of the load lock module to the stages of the process modules.