Substrate Transfer Exhaust Ports for Particle Control
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Solution Overview
Problem
Conventional substrate transfer equipment has a complex configuration due to the need for extra space for local exhaust ducts and suffers from contamination by particles generated during high-speed wafer transfer, especially when the wafer transfer arm moves up and down.
Innovation Solution
A substrate transfer system with a simple configuration that includes upper and lower exhaust ports positioned strategically along the support axis of the elevating mechanism to effectively capture and discharge particles generated during high-speed movement, ensuring minimal contamination of substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a local exhaust duct is installed close to the ball screw to suppress particle contamination, then substrate contamination is reduced, but the equipment configuration becomes complex and requires extra space in the load area
Solution Approach 1:
The exhaust function is extracted from a separate local exhaust duct and integrated directly into the substrate transfer mechanism itself. The exhaust ports are built into the substrate transfer part, allowing particles to be discharged at the source without requiring external exhaust ducts, thereby simplifying the overall equipment configuration while maintaining effective particle suppression.
Solution Approach 2:
The substrate transfer part is given multiple functions: it not only transfers substrates but also serves as the exhaust mechanism for particle removal. By integrating exhaust ports into the transfer mechanism, the system combines substrate handling and particle discharge functions into a single component, reducing the need for separate exhaust infrastructure.
2Productivity
If the substrate transfer part moves up and down at high speed to improve productivity, then throughput increases, but particles easily enter the rear area in the movement direction causing contamination
Solution Approach 1:
Exhaust ports are positioned at strategic locations (above and below the moving range) to preemptively discharge particles before they can spread to contaminated areas. The exhaust function is activated in advance of particle generation during high-speed movement, creating a protective气流 that prevents particle migration to the rear area.
Solution Approach 2:
The exhaust ports are positioned in the vertical dimension (above and below the moving range) rather than only in the horizontal movement direction. This three-dimensional exhaust arrangement effectively captures particles generated during vertical high-speed movement, preventing them from entering the rear area regardless of the direction of particle ejection during rapid acceleration and deceleration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively suppresses substrate contamination by particles while maintaining high throughput, as demonstrated by reduced particle generation and improved gas flow patterns during both vertical and horizontal movements of the wafer transfer arm.
Implementation Method 1
a first exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis above an upper limit of the predetermined range, a second exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis below a lower limit of the predetermined range
Data Source
AI summary
A substrate transfer system includes a substrate transfer part capable of transferring a substrate while holding the substrate, an elevating mechanism including a support axis extending in an upper-lower direction and being capable of moving the substrate transfer part along the support axis within a predetermined range, a first exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis above an upper limit of the predetermined range, a second exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis below a lower limit of the predetermined range, and an exhaust part connected such that exhaust is available through the first exhaust port and the second exhaust port.