Substrate Transfer Vessel for Continuous Immersion Cleaning
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Solution Overview
Problem
The miniaturization of semiconductor manufacturing leads to a pattern leaning phenomenon due to surface tension, where patterns collapse as substrates are removed from processing liquids in batch-type cleaning processes.
Innovation Solution
A substrate transferring apparatus with a crane and vertically movable vessel, comprising interlocking sub-vessels, transfers substrates between cleaning tanks, maintaining immersion and preventing pattern collapse by continuous liquid contact.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If substrates are removed from processing liquid in batch-type cleaning processes, then cleaning efficiency is improved, but pattern collapse occurs due to surface tension
Solution Approach 1:
A transfer liquid is introduced as an intermediary medium between the processing liquid and air. The substrate is transferred through this transfer liquid medium, which prevents direct contact with air and eliminates surface tension effects that cause pattern collapse. The transfer liquid acts as a protective intermediary that maintains substrate integrity during the transfer process while allowing efficient batch-type cleaning operations to continue.
2Duration of action of stationary object
If substrates are transferred between cleaning tanks, then cleaning process continuity is improved, but pattern leaning phenomenon occurs due to surface tension
Solution Approach 1:
The transfer liquid serves as a mediator that enables continuous substrate transfer between cleaning tanks without exposing substrates to air. By maintaining substrate immersion in the transfer liquid during transfer operations, the system achieves process continuity while preventing pattern leaning that would otherwise occur due to surface tension forces at the liquid-air interface.
Solution Approach 2:
The substrate transfer process is designed to maintain continuous immersion in liquid throughout the transfer operation. The substrate remains continuously surrounded by liquid (either processing liquid or transfer liquid) without breaking the liquid envelope, ensuring that the useful action of liquid protection continues uninterrupted during transfer, thereby preventing pattern damage while maintaining process continuity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents pattern collapse by ensuring continuous immersion of substrates during transfer between cleaning tanks, effectively addressing the surface tension issues in miniaturized semiconductor processing.
Implementation Method 1
a phenomenon in which patterns collapse due to surface tension (pattern leaning phenomenon) may occur as a substrate escapes from processing liquid
Implementation Method 2
The first processing liquid may be phosphoric acid (H3PO4), and the second processing liquid may be de-ionized water (DIW)
Data Source
AI summary
Proposed is a substrate transferring apparatus, and a liquid processing apparatus and substrate processing equipment including the same, which prevent a pattern leaning phenomenon during a substrate processing process. The substrate transferring apparatus that transfers substrates between cleaning tanks in the batch-type liquid processing apparatus includes a rail extended on a ceiling of a first cleaning tank in which a first processing liquid is stored and a second cleaning tank in which a second processing liquid is stored, a crane moving along the rail, and a vessel configured to be moved vertically by the crane. The vessel may include a first sub vessel and a second sub vessel that combine with each other to form a space for accommodating a substrate immersed in the first processing liquid.