Substrate Holder Transfer Overlap for Faster Wafer Cleaning

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Solution Overview

Problem

Existing substrate processing devices face challenges in improving throughput due to the time required for cleaning each substrate, which hampers the efficiency of processing large numbers of substrates.

Innovation Solution

A substrate processing device and method that utilize multiple holders and movers to overlap the periods of rotation stop and horizontal or vertical movement operations, allowing simultaneous cleaning of both the center and outer regions of a substrate, thereby reducing overall processing time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If sequential cleaning processing is performed on substrates using a single holder, then cleaning quality is maintained, but processing time per substrate increases and throughput decreases

Engineering Contradiction:
ImprovethroughputVSAvoidprocessing time per substrate
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The substrate holder is divided into two independent holders: a first substrate holder for holding the peripheral portion and a second substrate holder for holding the lower-surface center region. This segmentation allows simultaneous independent operation of cleaning and transfer processes, enabling parallel execution of multiple operations that were previously sequential, thereby reducing total processing time and increasing throughput

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The first substrate holder performs preliminary cleaning of the peripheral portion before the substrate is fully transferred to the second holder. This preliminary action allows the cleaning process to begin earlier in the transfer sequence, overlapping cleaning time with transfer time and reducing the overall processing time per substrate

Inventive Principle:
Principle #10Preliminary action

2Productivity

If multiple substrate holders and coordinated movement systems are used to reduce processing time, then throughput improves, but device complexity increases

Engineering Contradiction:
ImprovethroughputVSAvoidnumber of substrate holders and movers
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The first substrate holder serves multiple functions: it holds the substrate during initial positioning, performs preliminary cleaning of the peripheral portion, and facilitates transfer to the second holder. This multi-functionality reduces the need for additional dedicated components, thereby limiting the increase in device complexity while still achieving throughput improvement through parallel operations

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly enhances the throughput of substrate processing by optimizing the cleaning process, enabling faster transfer and cleaning of substrates with reduced operational overlap.

Implementation Method 1

a brush cleaner configured to bring a brush into contact with the lower-surface center region of the substrate held by the first substrate holder to clean the lower-surface center region and bringing the brush into contact with a lower-surface outer region surrounding the lower-surface center region of the substrate held by the second substrate holder to clean the lower-surface outer region

Methodology Applied
Scientific EffectBrush: Brush

Implementation Method 2

the substrate cleaning device described in JP 5904169 B2 includes two suction pads for holding the back-surface peripheral portion of a wafer

Methodology Applied
Scientific EffectSuction: Suction

Data Source

PatentUS12616001B2Substrate processing device and substrate processing method
Publication Date: 2026.04.28 SCREEN HOLDINGS CO LTD
  • US12616001B2 patent drawing
  • US12616001B2 patent drawing
  • US12616001B2 patent drawing

AI summary

A substrate is held by an upper holding device, and a lower-surface center region of the substrate is cleaned. During this cleaning, a suction holder of a lower holding device located below the upper holding device is rotated. The substrate held by the upper holding device is transferred to a suction holder of the lower holding device. A lower-surface outer region of the substrate held by the suction holder is cleaned. After the lower-surface center region of the substrate is cleaned and until the substrate is transferred to the suction holder of the lower holding device, rotation of the lower holding device is stopped. Further, the suction holder is moved in a horizontal direction by a base device. A rotation stopping operation for the suction holder and a horizontal moving operation for the suction holder are performed such that the periods for these operation at least partially overlap with each other.