Substrate Transfer Position Sensing in Reduced-Pressure Handling

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional substrate transfer apparatuses in reduced pressure atmospheres can only measure the substrate's position when it passes through a connective hole, limiting continuous monitoring and increasing the risk of transfer failures.

Innovation Solution

A substrate transfer apparatus equipped with a substrate holder and a substrate measurer that continuously measures the substrate's position using CMOS line sensors or other distance-measuring technologies integrated into the transfer arm, allowing for real-time monitoring and accurate positioning.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a sensor is disposed at the connective hole to detect substrate position, then the substrate position can be detected at the connective hole, but continuous monitoring of substrate position during transfer is not possible

Engineering Contradiction:
Improvesubstrate position detectionVSAvoidtransfer failure risk
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The substrate transfer apparatus is divided into multiple measurement zones: a first substrate measurer (camera) positioned at the connective hole for detection during transfer, and a second substrate measurer positioned at the substrate processing apparatus for detection upon arrival. This segmentation allows continuous monitoring at different stages of the transfer process, reducing the risk of undetected position errors.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

A first substrate measurer (camera) is introduced as an intermediary detection device positioned at the connective hole to capture substrate position images during transfer. This intermediary measurement system works in conjunction with the existing sensor at the substrate processing apparatus, providing additional monitoring points without interfering with the normal transfer operation.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Device complexity

If substrate position is only measured at the connective hole, then the measurement system is simple, but the likelihood of transfer failures increases

Engineering Contradiction:
Improvemeasurement system complexityVSAvoidtransfer failure rate
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The measurement system is segmented into multiple independent measurement points: the first substrate measurer at the connective hole and the second substrate measurer at the substrate processing apparatus. Each measurer independently monitors substrate position at its location, providing redundant detection without requiring a single complex measurement system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The measurement function continues throughout the substrate transfer process by using multiple measurers at different positions. The first measurer monitors during transfer through the connective hole, and the second measurer monitors upon arrival at the substrate processing apparatus, ensuring continuous monitoring rather than intermittent measurement.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables continuous monitoring and accurate positioning of substrates during transfer, reducing the likelihood of transfer failures and ensuring precise placement in both atmospheric and reduced pressure environments.

Implementation Method 1

a substrate measurer, provided on the substrate holder, to measure a position of the substrate with respect to the substrate holder

Methodology Applied
Scientific EffectOptical detection: Light

Data Source

PatentUS12142506B2Substrate transfer apparatus, substrate processing system and substrate processing method
Publication Date: 2024.11.12 TOKYO ELECTRON LTD
  • US12142506B2 patent drawing
  • US12142506B2 patent drawing
  • US12142506B2 patent drawing

AI summary

The present disclosure relates to a substrate transfer apparatus for transferring a substrate to a substrate processing apparatus in a reduced pressure atmosphere. The apparatus comprises a substrate holder to hold the substrate; and a substrate measurer, provided on the substrate holder, to measure a position of the substrate with respect to the substrate holder.