Substrate Transfer Speed Control for Semiconductor Processing

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Solution Overview

Problem

In substrate processing apparatuses, the operating speed of substrate transfer devices is often set to achieve maximum throughput, leading to potential overload and wear-out, especially when processing times vary across modules, and existing solutions fail to adjust speed reliably without risking transfer failures.

Innovation Solution

A substrate processing apparatus and method that dynamically adjust the operating speed of the substrate transfer device based on the processing time of substrates, using a parameter storage unit to store transfer parameters corresponding to different processing rates, and a parameter selecting unit to choose the appropriate speed to match the minimum required processing rate, ensuring high transfer reliability and minimizing load on the transfer device.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the operating speed of the substrate transfer device is set to achieve maximum throughput, then the productivity is improved, but the reliability deteriorates due to overload and wear-out

Engineering Contradiction:
ImprovethroughputVSAvoidtransfer reliability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The operating speed of the substrate transfer device is made dynamically adjustable based on processing conditions. The control device receives processing time information from processing modules and automatically adjusts the transfer speed to match the actual processing capacity, allowing the system to operate at optimal speeds rather than fixed maximum speeds, thereby preventing overload while maintaining productivity.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The transfer parameters (speed, acceleration, timing) are changed based on processing time variations. When processing modules complete tasks faster or slower than expected, the control device modifies the transfer device's operating parameters accordingly, ensuring synchronization between transfer operations and processing operations, thus preventing both overload and standby time.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If the operating speed of the substrate transfer device is reduced to avoid overload, then the reliability is improved, but the productivity deteriorates due to standby time

Engineering Contradiction:
Improvetransfer reliabilityVSAvoidthroughput
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The control device continuously monitors the actual processing times from processing modules and uses this feedback to adjust the transfer device's operating speed in real-time. This closed-loop control ensures that the transfer device operates at the precise speed needed to match processing capacity, preventing both overload (by not exceeding capacity) and standby time (by not operating slower than necessary), thus maintaining both reliability and productivity.

Inventive Principle:
Principle #23Feedback

3Reliability

If the operating speed is dynamically adjusted based on processing time, then the reliability is improved, but the device complexity increases

Engineering Contradiction:
Improvetransfer reliabilityVSAvoidcontrol complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The control device performs multiple functions: it monitors processing times from various processing modules, determines appropriate transfer speeds based on this information, and adjusts the transfer device's operating parameters. By consolidating these control functions into a single multi-functional control device, the system achieves dynamic speed adjustment without proportionally increasing overall system complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS10395957B2Substrate processing apparatus, substrate processing method and storage medium
Publication Date: 2019.08.27 TOKYO ELECTRON LTD
  • US10395957B2 patent drawing
  • US10395957B2 patent drawing
  • US10395957B2 patent drawing

AI summary

A substrate processing unit 14 includes processing modules 2 each performing a process on a substrate, and a substrate transfer device 121 is provided between a mounting unit 11 and the processing modules. A parameter storage unit 3 stores sets of transfer parameter 33 where an operating speed of the substrate transfer device corresponds to a processing number of substrates per a unit time. A parameter selecting unit 4 compares a processing number of substrates per a unit time determined based on a recipe 31 corresponding to the process, with those corresponding to the transfer parameters and selects a transfer parameter corresponding to the minimum processing number of substrates among the processing numbers of substrates equal to or larger than that determined based on the recipe. A transfer control units 151 to 153 control the substrate transfer device based on a set value of the selected transfer parameter.