Substrate Transfer Unit for Simultaneous Multi-Substrate Processing

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Current substrate processing systems are limited in their ability to process multiple substrates simultaneously, leading to inefficiencies in manufacturing processes for display panels, where metal thin films and inorganic layers are formed on substrates.

Innovation Solution

A substrate processing system is designed to load and transfer multiple substrates at once, featuring a substrate loading unit with specific frame and support bar configurations, and a transfer unit with robot arms, allowing for simultaneous processing in multiple process chambers with stages equipped for high-frequency and electrostatic adsorption power, along with insulation layers to prevent plasma arcs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If substrates are transferred one by one from the cassette to the substrate processing apparatus, then the transfer mechanism is simple, but the processing efficiency is low and multiple substrates cannot be processed simultaneously

Engineering Contradiction:
Improveprocessing efficiencyVSAvoidtransfer mechanism complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

Multiple substrates are transferred simultaneously through a single transfer mechanism rather than transferring them one by one. The transfer unit is configured to hold and move multiple substrates together, merging multiple transfer operations into one, thereby improving processing efficiency while maintaining relatively simple mechanism design

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The transfer unit is designed to perform multiple functions: it can transfer different numbers of substrates (1 or multiple) depending on the processing requirements. This multi-functional design allows the system to adapt to different production needs without requiring separate transfer mechanisms for single and multiple substrate transfers

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Productivity

If multiple substrates are transferred at the same time, then processing efficiency is improved, but the transfer mechanism and system complexity increase

Engineering Contradiction:
Improvebatch processing capabilityVSAvoidsubstrate loading unit structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The substrate loading unit is divided into multiple independent areas (first area and second area), each capable of holding substrates. This segmentation allows flexible configuration of substrate positions and enables the transfer mechanism to handle multiple substrates simultaneously while maintaining a relatively simple and modular structure that can be scaled based on production needs

Inventive Principle:
Principle #1Segmentation

3Reliability

If multiple substrates are disposed on the same stage without insulation, then the device structure is simple, but plasma arcs may occur between adjacent substrates

Engineering Contradiction:
Improveplasma arc preventionVSAvoidinsulation layer configuration
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

An insulation layer is introduced as an intermediary element between adjacent substrates on the same stage. This insulation layer prevents direct electrical contact between substrates, thereby preventing plasma arcs while maintaining a relatively simple overall device structure. The insulation layer can be implemented as a thin coating or discrete insulating elements positioned between substrates

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This system enables efficient processing of multiple substrates concurrently, improving manufacturing efficiency by allowing for simultaneous formation of metal thin films and inorganic layers on substrates, thereby enhancing production capabilities.

Implementation Method 1

a stage on which the N substrates are disposed, and an insulation layer disposed between the N substrates

Methodology Applied
Scientific EffectElectrostatic adsorption: Electrostatics

Implementation Method 2

an insulation layer disposed between the N substrates

Methodology Applied
Scientific EffectPlasma arc prevention through insulation: Electrical Resistance

Data Source

PatentUS11355384B2Substrate processing system
Publication Date: 2022.06.07 SAMSUNG DISPLAY CO LTD
  • US11355384B2 patent drawing
  • US11355384B2 patent drawing
  • US11355384B2 patent drawing

AI summary

A substrate processing system includes a substrate loading unit which loads a plurality of substrates, a substrate transfer unit which transfers N (where N is natural number) substrates at the same time from the substrate loading unit, and a substrate processing unit including a plurality of process chambers which receives the N substrates at the same time from the substrate transfer unit and processes the received substrates where each of the process chambers includes a stage on which the N substrates are disposed and an insulation layer disposed between the N substrates.