Substrate Transport Layout for Higher-Throughput Cleaning Paths
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current substrate treating apparatuses experience reduced throughput due to the lack of cleaning treatments during transportation between treating blocks in both forward and return paths, leading to inefficient substrate handling.
Innovation Solution
The apparatus includes a first indexer block and a second indexer block, with carrier platforms in both, allowing substrates to be transported and treated in a manner that reduces the need for redundant transportation processes, enhancing throughput by optimizing the path between treating blocks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If substrates are transported reciprocated between ID block and second treating block, then cleaning treatment is performed, but throughput is reduced due to unnecessary transportation steps
Solution Approach 1:
The system is divided into multiple independent indexer blocks (first ID block, second ID block, third ID block) that can operate simultaneously. Each indexer block manages substrate transport independently, allowing parallel processing of multiple substrates and eliminating the need for single-path reciprocation.
Solution Approach 2:
The substrate transport system transitions from a single linear path to a multi-dimensional network with multiple indexer blocks positioned at different locations. This allows substrates to be transported through different routes simultaneously, adding spatial dimensions to the transport system and enabling parallel operations.
2Reliability
If cleaning treatment is performed during substrate transportation, then substrate cleanliness is improved, but the transportation path becomes more complex
Solution Approach 1:
Each indexer block is designed to perform multiple functions: substrate storage, substrate transport, and cleaning treatment. The treating blocks integrated with indexer blocks can perform cleaning on both front and rear faces of substrates during normal transport operations, eliminating the need for separate cleaning stations and simplifying the overall system architecture.
Solution Approach 2:
The substrate transport system performs cleaning treatments autonomously during the normal transportation process. The treating blocks integrated with indexer blocks automatically clean substrates as they pass through, without requiring additional dedicated cleaning steps or interrupting the transport flow.
Data Source
AI summary
A substrate treating apparatus and a substrate transporting method wherein a platform is disposed on a first ID block, and a platform is placed on a second ID block. A currently-used carrier platform is provided only on the first ID block. Accordingly, a substrate is transported in both a forward path and a return path between the first ID block and a second treating block. The substrate is returned not to the first ID block but to the second ID block disposed between the two treating blocks in the return path.