Substrate Transport Path Segmentation for Throughput
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Solution Overview
Problem
The existing substrate treating apparatus experiences reduced throughput due to unnecessary substrate transportation processes between the indexer block, coating block, developing block, and interface block, where the coating block performs processes only in the forward path and the developing block in the return path, leading to inefficiencies in both paths.
Innovation Solution
The apparatus is reconfigured with an indexer block and an interface block, each equipped with a carrier platform, where the substrate is transported directly between these blocks, bypassing unnecessary processing steps, and additional treating blocks are introduced to perform specific treatments, reducing the reliance on the coating block in the return path and enhancing overall throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate is transported reciprocated between the ID block and the IF block through all treating blocks in both forward and return paths, then the substrate can receive treatment in both directions, but the throughput is reduced due to unnecessary transportation processes where the substrate passes through blocks without receiving treatment
Solution Approach 1:
The treating blocks are divided into two groups: first end side blocks (coating block, developing block) and second end side blocks (heating block, cooling block). The substrate transport path is segmented into forward path (ID block → first end side blocks → IF block) and return path (IF block → second end side blocks → ID block), allowing different blocks to perform treatments in different directions, thereby eliminating unnecessary transportation steps.
Solution Approach 2:
The conventional approach transports the substrate through all blocks in both forward and return paths. This invention inverts the approach by having the substrate transported only through necessary blocks in each direction: the forward path handles coating and developing, while the return path handles heating and cooling, thus eliminating redundant transportation processes.
2Productivity
If the coating block performs coating process only in the forward path and not in the return path, then the process sequence is simplified, but the substrate must still be transported through the coating block in the return path without receiving treatment, reducing efficiency
Solution Approach 1:
Different treating blocks are assigned different functional roles based on their position: the coating block and developing block on the first end side perform treatments in the forward path, while the heating block and cooling block on the second end side perform treatments in the return path. This local differentiation allows the substrate to be transported only through active treatment blocks in each direction, eliminating idle transportation.
3Productivity
If the substrate transport path includes all treating blocks in both forward and return directions, then all blocks can potentially treat the substrate, but the actual throughput is reduced because the substrate passes through blocks without treatment in certain directions
Solution Approach 1:
The substrate transport process is optimized to ensure continuous useful action: in the forward path, the substrate receives coating and developing treatments continuously; in the return path, it receives heating and cooling treatments continuously. By eliminating segments where the substrate is transported without treatment, the useful action continues without interruption, maximizing throughput and transport speed.
Data Source
AI summary
A substrate treating apparatus and a substrate transporting method. An ID block 2, a coating block 3, a developing block 4, and an IF block 6 are arranged in this order. A platform 13 is placed on the ID block 2, and a platform 47 is placed on the IF block 6. A currently-used carrier platform is provided only on an ID block. Accordingly, a substrate is transported in both a forward path and a return path between the ID block and the IF block. According to the disclosure, a substrate W is transported from the IF block 6 to the developing block 4 in the return path, and thereafter, the substrate W is returned back from the developing block 4 to the IF block 6 without being transported to the coating block 3. Consequently, transportation process by the coating block 3 in the return path is reduced so that an entire throughput of a substrate treating apparatus 1 can be enhanced.