Substrate Processing Tray with Downstream Standing Portion

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Solution Overview

Problem

In substrate processing using a supercritical fluid, residual liquid can re-adhere to the substrate due to backflow from the gap between the substrate and the support tray, leading to inefficiencies in drying and potential pattern collapse.

Innovation Solution

A substrate processing apparatus with a support tray design that includes a downstream-side standing portion below the substrate's upper surface, directing residual liquid away from the substrate's surface, and a laminar flow of processing fluid to prevent re-adhesion during the supercritical drying process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Stability of the object's composition

If the substrate is supported close to the support tray surface to maintain stability, then the substrate positioning stability is improved, but residual liquid can flow back from the gap between the substrate and support tray to the substrate surface causing re-adhesion

Engineering Contradiction:
Improvesubstrate positioning stabilityVSAvoidresidual liquid re-adhesion
Core Design Contradiction:
Stability of the object's compositionVSObject-affected harmful factors

Solution Approach 1:

The support tray is segmented into a flat plate portion and a downstream-side standing portion at different heights. This segmentation creates a height difference that prevents residual liquid backflow while maintaining substrate stability on the flat portion.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The solution introduces a vertical height dimension by adding the downstream-side standing portion that extends lower than the flat plate portion. This dimensional change creates a liquid trap that prevents residual liquid from reaching the substrate surface.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Device complexity

If a shallow recess is provided in the support tray to hold the substrate, then the substrate support structure is simplified, but residual liquid remaining in the gap can flow back to the substrate surface

Engineering Contradiction:
Improvesupport structure complexityVSAvoidresidual liquid backflow
Core Design Contradiction:
Device complexityVSObject-affected harmful factors

Solution Approach 1:

The support tray is divided into functional segments: a flat plate portion for substrate support and a downstream-side standing portion for liquid management. This segmentation solves the backflow problem while maintaining structural simplicity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The downstream-side standing portion acts as an intermediary structure between the substrate and the downstream environment, intercepting residual liquid before it can flow back to the substrate surface.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Ease of manufacture

If the support tray surface is positioned close to the substrate to minimize gap, then the structural simplicity is improved, but residual liquid in the narrow gap can flow back to the substrate surface

Engineering Contradiction:
Improvesupport tray manufacturing simplicityVSAvoidresidual liquid re-adhesion
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The support tray is segmented into a flat plate portion at one height and a downstream-side standing portion at a lower height. This segmentation prevents residual liquid backflow while maintaining manufacturing simplicity through a straightforward structural design.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Effectively prevents re-adhesion of residual liquid to the substrate, ensuring efficient drying and preventing pattern collapse by directing residual liquid away from the substrate's surface using a support tray configuration with a downstream-side standing portion and laminar fluid flow.

Implementation Method 1

supplying the processing fluid into the internal space from one end side of the internal space, thereby forming a laminar flow of the processing fluid flowing toward the other end side of the internal space along the upper surface of the substrate

Methodology Applied
Scientific EffectLaminar flow: Laminar Flow

Implementation Method 2

processing a substrate with a liquid adhering to an upper surface of the substrate using a processing fluid in a supercritical state

Methodology Applied
Scientific EffectSupercritical fluid extraction: Supercritical Fluid Extraction

Data Source

PatentUS20240157390A1Substrate processing apparatus and substrate processing method
Publication Date: 2024.05.16 SCREEN HOLDINGS CO LTD
  • US20240157390A1 patent drawing
  • US20240157390A1 patent drawing
  • US20240157390A1 patent drawing

AI summary

In the substrate processing apparatus, a support tray supporting a substrate is housed in an internal space of a chamber. A processing fluid is supplied into the internal space from one end side of the internal space. The support tray includes a tray member and a plurality of support members attached to the tray member in such a manner as to surround a substrate facing surface. The tray member has a downstream-side standing portion that has a downstream-side standing portion that stands upward further than the substrate facing surface while located in proximity to a peripheral surface of the substrate on a downstream side supported by the plurality of support members. An upper surface of the downstream-side standing portion is below the upper surface of the substrate in a vertical direction supported by the plurality of support members.