Substrate Treating Apparatus Decomposition Unit for Alkaline Gas
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Solution Overview
Problem
In semiconductor manufacturing, the HMDS process generates alkaline gases that leak and are not adequately released due to limitations in exhaust pressure or volume, leading to vortex formation, particle generation, and non-uniform substrate treatment.
Innovation Solution
A substrate treating apparatus with a heat treatment chamber and a decomposition unit using a photo-catalyst, such as titanium dioxide, to decompose alkaline gases like ammonia into harmless substances, independent of the exhaust line's evacuation process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the exhaust pressure or exhaust volume is adjusted to release the alkaline gas, then the alkaline gas can be released from the chamber, but a vortex is generated in the chamber and particles are generated due to gas flow changes
Solution Approach 1:
The harmful alkaline gas is extracted from the chamber through the exhaust line before the substrate is fully loaded or unloaded, separating the gas removal function from the substrate handling process. This prevents the gas from interfering with substrate treatment while avoiding vortex formation during critical handling moments.
Solution Approach 2:
The exhaust line is activated in advance to remove alkaline gas from the chamber before substrate loading or unloading operations begin. This preliminary gas removal prevents the generation of harmful gas flows and particles during substrate handling, ensuring clean treatment conditions.
2Quantity of substance
If the exhaust pressure or exhaust volume is adjusted to release the alkaline gas, then the alkaline gas can be released from the chamber, but the treatment of the substrate by the HMDS gas may not be uniformly performed
Solution Approach 1:
The alkaline gas is extracted from the chamber through the exhaust line before substrate treatment begins, separating the gas removal function from the treatment process. This ensures that the HMDS gas treatment is performed in a controlled environment without interference from alkaline gas flows, maintaining uniform treatment across the substrate.
Solution Approach 2:
The exhaust system is activated in advance to remove alkaline gas from the chamber before HMDS gas treatment starts. This preliminary action establishes stable gas flow conditions that ensure uniform substrate treatment while preventing particle generation and vortex formation during the critical treatment phase.
3Device complexity
If the alkaline gas is not appropriately released due to exhaust line limitations, then the exhaust system remains simple, but the alkaline gas accumulates in the chamber causing treatment problems
Solution Approach 1:
The exhaust line acts as an intermediary component that connects the chamber to the external environment, providing a dedicated pathway for alkaline gas removal. This simple addition enables effective gas evacuation without requiring complex exhaust systems, maintaining device simplicity while preventing gas accumulation and associated treatment problems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures efficient and uniform substrate treatment by minimizing the influence of exhaust volume and pressure on gas flow, preventing particle generation and ensuring complete gas release, thereby improving the treatment process.
Implementation Method 1
a decomposition unit that decomposes an alkaline gas leaking from the treatment space to the interior space... the decomposition unit may include a photo-catalyst... the photo-catalyst may contain titanium dioxide (TiO2)
Data Source
AI summary
An apparatus for treating a substrate includes a heat treatment chamber having an interior space, a housing that is provided in the interior space and that has a treatment space therein, a gas supply line that supplies, into the treatment space, a hydrophobic gas for hydrophobicizing the substrate, and a decomposition unit that decomposes an alkaline gas leaking from the treatment space to the interior space.