Substrate Treating Apparatus with Individual Gas Supply

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Solution Overview

Problem

Conventional substrate treating apparatuses lack the ability to individually adjust gas supply and exhaust rates for each treating unit, leading to suboptimal treatment quality due to synchronized operation of multiple units.

Innovation Solution

The apparatus features individual gas supply and exhaust devices for each solution treating unit, allowing adjustable gas rates to match the specific needs of each unit, with separate distribution and collection systems to prevent interference and enhance precision.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a single gas supply device is used for multiple treating units, then the device complexity is reduced, but the adaptability of gas supply rates to different treating units deteriorates

Engineering Contradiction:

Improvegas supply device structureVSAvoidgas supply rate adjustment

Core Design Contradiction:

Device complexityVSAdaptability or versatility

Solution Approach 1:

The gas supply system is divided into multiple independent gas supply devices, each dedicated to a specific treating unit. This segmentation allows each device to independently control gas supply rate to its corresponding treating unit, resolving the contradiction between device complexity and adaptability by organizing complexity in a modular, manageable way.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Each gas supply device is configured with local adjustment capabilities specific to its associated treating unit. The gas supply rate can be individually optimized for each treating unit's specific requirements, enabling local quality control rather than uniform global control, thus improving adaptability while maintaining manageable system complexity.

Inventive Principle:

Principle #3Local quality

2Ease of operation

If gas supply rates are synchronized for all treating units, then the control system is simplified, but the treatment quality for units operating at different times deteriorates

Engineering Contradiction:

Improvegas supply controlVSAvoidtreatment quality

Core Design Contradiction:

Ease of operationVSManufacturing precision

Solution Approach 1:

The gas supply system transitions from static synchronized control to dynamic independent control. Each gas supply device can dynamically adjust its gas supply rate based on the real-time operational status and specific requirements of its corresponding treating unit, enabling precise control during staggered treatment periods while maintaining ease of operation through standardized device interfaces.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

Each gas supply device is pre-configured with adjustment capabilities and control mechanisms that allow it to be independently tuned before operation. This preliminary configuration enables each device to be optimized for its specific treating unit's requirements, ensuring high treatment quality while maintaining simple operational procedures through standardized controls.

Inventive Principle:

Principle #10Preliminary action

3Adaptability or versatility

If individual gas supply devices are provided for each treating unit, then the adaptability of gas supply rates improves, but the device complexity increases

Engineering Contradiction:

Improvegas supply rate adjustmentVSAvoidgas supply device structure

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The gas supply system is segmented into multiple independent devices, each handling a single treating unit. This segmentation reduces the complexity of control logic within each device while maintaining high adaptability through individual adjustment capabilities. The overall system complexity is managed through modular architecture rather than a single complex centralized system.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

Each gas supply device incorporates dynamic adjustment mechanisms that enable real-time rate control. This dynamic capability provides high adaptability to different treating unit requirements while the standardized design of each device keeps individual device complexity manageable. The system achieves high adaptability through multiple simple, flexible units rather than one complex rigid system.

Inventive Principle:

Principle #15Dynamics

Data Source

PatentUS11373889B2Substrate treating apparatus

Publication Date: 2022.06.28 SCREEN HOLDINGS CO LTD

AI summary

A substrate treating apparatus includes a plurality of solution treating units for performing solution treatment of substrates, and a plurality of individual gas supply devices provided to correspond individually to the solution treating units, each for supplying gas at a variable rate only to one of the solution treating units. The solution treating units perform the solution treatment by supplying treating solutions to the substrates. The individual gas supply devices supply gas only to the solution treating units corresponding thereto. The individual gas supply devices supply the gas at adjustable rates to the solution treating units. The rate of gas supply to the solution treating units can therefore be varied for each solution treating unit.