Substrate Treating Apparatus with Reordering Interface

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Solution Overview

Problem

Conventional substrate treating apparatuses with single main transport mechanisms limit throughput and face challenges in maintaining the order of substrates during parallel treatment processes, leading to difficulties in controlling and tracking the treatment history of each substrate.

Innovation Solution

A substrate treating apparatus with a treating section featuring multiple substrate treatment lines that operate in parallel, an interface section with a buffer unit, and a transport mechanism that adjusts the order of substrates to ensure they are transported to the exposing machine in the same order as they were loaded, maintaining efficient processing and independent operation of each treatment line.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple substrate treatment lines operate in parallel, then throughput is improved, but substrate order control becomes difficult

Engineering Contradiction:
ImprovethroughputVSAvoidsubstrate order control
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

A buffer unit is introduced as an intermediary between the parallel treatment lines and the exposing machine. This buffer temporarily stores substrates and allows the system to reorder them before final transport, decoupling the parallel processing from the sequential output requirement and enabling both high throughput and reliable order control.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The system performs preliminary ordering operations by storing substrates in the buffer unit in advance of their final destination. This allows substrates to be arranged in the correct sequence before being transported to the exposing machine, ensuring proper order control even when multiple treatment lines operate simultaneously.

Inventive Principle:
Principle #10Preliminary action

2Productivity

If multiple substrate treatment lines operate in parallel, then processing efficiency increases, but tracking treatment history becomes complex

Engineering Contradiction:
Improveprocessing efficiencyVSAvoidtreatment history tracking
Core Design Contradiction:
ProductivityVSLoss of information

Solution Approach 1:

The control unit implements a feedback system that tracks each substrate's movement through the parallel treatment lines and its position in the buffer unit. This feedback mechanism maintains accurate treatment history information despite the complexity of multiple concurrent processing paths, allowing reliable tracking and control.

Inventive Principle:
Principle #23Feedback

3Device complexity

If a single main transport mechanism is used, then device complexity is reduced, but throughput is limited

Engineering Contradiction:
Improvetransport mechanism structureVSAvoidthroughput
Core Design Contradiction:
Device complexityVSProductivity

Solution Approach 1:

The transport system is segmented into multiple independent treatment lines, each with its own transport capability. This segmentation allows parallel processing of substrates through different lines, significantly increasing throughput while keeping each individual line relatively simple in structure.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS9368383B2Substrate treating apparatus with substrate reordering
Publication Date: 2016.06.14 SCREEN SEMICON SOLUTIONS CO LTD
  • US9368383B2 patent drawing
  • US9368383B2 patent drawing
  • US9368383B2 patent drawing

AI summary

A treating section has substrate treatment lines arranged one over the other for treating substrates while transporting the substrates substantially horizontally. An IF section transports the substrates fed from each substrate treatment line to an exposing machine provided separately from this apparatus. The substrates are transported to the exposing machine in the order in which the substrates are loaded into the treating section. The throughput of this apparatus can be improved greatly, without increasing the footprint, since the substrate treatment lines are arranged one over the other. Each substrate can be controlled easily since the order of the substrates transported to the exposing machine is in agreement with the order of the substrates loaded into the treating section.