Substrate Treating Apparatus Vertical Feed Channels
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Solution Overview
Problem
Conventional substrate treating apparatuses face challenges in independently controlling the supply and exhaust of gases to different treatment chambers, leading to mutual influences and difficulties in precise control, affecting the treatment processes.
Innovation Solution
The apparatus includes vertically extended feed and exhaust channels that are relatively long and have varying sectional areas, along with regulators and distributors, to minimize mutual influence between gas supply and exhaust amounts across different treatment chambers, ensuring independent control and efficient gas flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a common wall duct is used to supply gases to both the resist liquid coating device and the developing device, then the device structure is simplified, but the supply amounts of gases to the two devices influence each other mutually
Solution Approach 1:
The patent divides the gas supply system into separate feed channels for the resist liquid coating device and developing device. Each feed channel has its own regulator, allowing independent control of gas supply amounts to each device without mutual interference, while still maintaining a relatively simplified overall structure.
2Reliability
If separate feed channels with long vertical members are used for each device, then independent control of gas supply is achieved, but the channel length increases
Solution Approach 1:
The patent positions the regulators at different heights along the vertical feed channels. The first regulator is positioned at a height corresponding to the resist liquid coating device, and the second regulator is positioned at a height corresponding to the developing device. This vertical arrangement allows independent control without requiring excessively long horizontal extensions.
3Loss of time
If the first feed channel supplies gases to the resist liquid coating device at a position equal in level to the device, then the flow path is short, but the supply amount to the developing device is also affected
Solution Approach 1:
The patent segments the gas supply system into distinct feed channels with separate regulators. The first feed channel supplies gas to the resist liquid coating device with a short flow path, while the second feed channel supplies gas to the developing device independently. This segmentation ensures both short flow paths and independent control are achieved simultaneously.
Data Source
AI summary
Disclosed is a substrate treating apparatus including a first liquid treatment chamber that performs a liquid treatment to a substrate, a second liquid treatment chamber that is disposed below the first liquid treatment chamber and performs a liquid treatment to a substrate, a first feed channel that supplies gases to the first liquid treatment chamber, and a second feed channel that supplies gases to the second liquid treatment chamber. The first feed channel includes a first vertical member that extends substantially vertically. The second feed channel includes a second vertical member that extends substantially vertically. The first vertical member and the second vertical member both extend to a position lower in level than the second liquid treatment chamber.