Substrate Treating Apparatus Deionized Water Removal

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Solution Overview

Problem

Conventional substrate treating apparatuses face challenges in achieving satisfactory drying of substrates with fine patterns due to residual deionized water, leading to potential collapse and unsatisfactory drying performance, especially in high-aspect-ratio structures and MEMS devices.

Innovation Solution

A substrate treating apparatus is designed with a system that includes a treating tank, a supply pipe, a separating device, and a deionized water removing device to minimize deionized water concentration in the treating liquid by circulating and separating deionized water from the solvent, using a combination of separation filters and adsorption filters to efficiently remove residual deionized water.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If deionized water is used as final treating liquid for cleaning substrates, then cleaning effectiveness is improved, but drying performance deteriorates due to residual water in fine structures

Engineering Contradiction:
Improvecleaning effectivenessVSAvoiddrying performance
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent applies preliminary action by replacing deionized water with solvent before the drying step. The solvent replacement process is performed in advance to prevent water residue issues during drying. The treating liquid is circulated and solvent is supplied to replace deionized water, ensuring fine structures are filled with solvent before substrates are pulled up for drying.

Inventive Principle:
Principle #10Preliminary action

2Reliability

If a large quantity of solvent is mixed into deionized water to replace water, then drying performance is improved, but deionized water concentration cannot be reduced below a certain level

Engineering Contradiction:
Improvedrying performanceVSAvoiddeionized water concentration
Core Design Contradiction:
ReliabilityVSQuantity of substance

Solution Approach 1:

The patent applies extraction by removing deionized water from the treating liquid through circulation and separation. A separating device is used to extract and remove deionized water from the solvent mixture, reducing water concentration to minimal levels. This allows effective solvent replacement without being limited by water concentration thresholds.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent applies parameter changes by monitoring and controlling the concentration of deionized water in the treating liquid. A concentration detection device detects water concentration, and the system adjusts the replacement process accordingly, changing the parameter of water concentration from above a certain level to minimal levels through controlled solvent supply and circulation.

Inventive Principle:
Principle #35Parameter changes

3Productivity

If substrates are moved from one treating tank to another, then series of treatments are performed, but fine patterns could collapse due to surface tension of deionized water

Engineering Contradiction:
Improveseries of treatmentsVSAvoidfine pattern integrity
Core Design Contradiction:
ProductivityVSStrength

Solution Approach 1:

The patent applies preliminary action by replacing deionized water with solvent before moving substrates between treating tanks. The solvent replacement is performed in advance to eliminate surface tension issues. By the time substrates are transferred for subsequent treatments, the fine patterns are already filled with solvent, preventing collapse during handling and transfer.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively reduces deionized water concentration in the solvent, preventing unsatisfactory drying and collapse of fine structures on substrates, ensuring improved drying performance and structural integrity.

Implementation Method 1

a separating device mounted on the first branch pipe for separating deionized water and a solvent in the treating liquid

Methodology Applied
Scientific EffectDensity separation: Density Gradient

Implementation Method 2

a deionized water removing device mounted on the second branch pipe for adsorbing and removing deionized water from the treating liquid

Methodology Applied
Scientific EffectAdsorption: Adsorption

Data Source

PatentUS8608864B2Substrate treating method
Publication Date: 2013.12.17 SCREEN HOLDINGS CO LTD
  • US8608864B2 patent drawing
  • US8608864B2 patent drawing
  • US8608864B2 patent drawing

AI summary

A substrate treating method for treating substrates with a treating liquid includes a deionized water cleaning step for supplying deionized water from an injection pipe and cleaning the substrates inside a cleaning tank with deionized water, then a replacing step for injecting a solvent from a solvent injector and replacing the deionized water with the solvent, a separating and removing step for switching a channel to a branch pipe and causing a separator to remove the deionized water from the treating liquid, and an adsorbing and removing step for switching the channel to another branch pipe and causing a deionized water remover to adsorb and remove the deionized water from the treating liquid.