Substrate treatment method using a block copolymer containing a hydrophilic and a hydrophobic polymers
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Solution Overview
Problem
The existing methods for forming fine resist patterns using block copolymers often result in deformation of the resist pattern during heat treatment, leading to undesired shapes of the hydrophobic polymer pattern, as the phase-separation of the block copolymer occurs along the deformed resist pattern, making it difficult to achieve the desired pattern on a substrate.
Innovation Solution
A substrate treatment method involving the formation of a thin film on the resist pattern before phase-separating the block copolymer, which suppresses deformation during heat treatment, allowing for appropriate phase-separation and formation of a predetermined pattern on the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If heat treatment is performed at high temperature to phase-separate the block copolymer, then phase-separation is achieved, but the resist pattern deforms
Solution Approach 1:
A thin film is introduced as an intermediary layer between the resist pattern and the block copolymer. This thin film acts as a mediator that suppresses the deformation of the resist pattern during high-temperature heat treatment, while still allowing the block copolymer to undergo phase-separation on top of it.
Solution Approach 2:
The thin film is formed on the resist pattern before applying the block copolymer and performing heat treatment. This preliminary action of forming the protective thin film prevents the resist pattern from deforming during subsequent high-temperature processing.
2Shape
If heating temperature is decreased to prevent resist pattern deformation, then resist pattern stability is maintained, but phase-separation of block copolymer is insufficient
Solution Approach 1:
The thin film serves as a protective intermediary that enables the system to maintain high heating temperatures without deforming the resist pattern. This resolves the contradiction by decoupling the temperature requirement for phase-separation from the thermal stability requirement of the resist pattern.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively prevents deformation of the resist pattern during phase-separation, enabling the formation of a predetermined pattern on the substrate by maintaining the desired shape of the block copolymer, thus improving the accuracy of pattern formation.
Implementation Method 1
a heat treatment is performed on the block copolymer to phase-separate the block copolymer into a hydrophilic polymer and a hydrophobic polymer
Implementation Method 2
irradiation with an ultraviolet ray is performed on the wafer to modify the polymer
Implementation Method 3
By supplying an organic solvent onto the wafer, the hydrophilic polymer is selectively removed
Data Source
AI summary
A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.