Substrate Treatment Nozzle and Tool Movement
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Solution Overview
Problem
Existing substrate treatment apparatuses face issues with impaired coatability and water marks on hydrophobic surfaces due to interference between physical tools and fixed nozzles, leading to drying and particle adhesion problems during substrate treatment.
Innovation Solution
A substrate treatment apparatus and method that includes a physical tool unit, a liquid supply nozzle, and a gas supply nozzle, with both units moving linearly in opposite directions across the substrate while it rotates, ensuring uniform treatment and preventing drying, thereby reducing water marks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a fixed nozzle is used to supply treatment liquid to the substrate, then the liquid supply is simple and stable, but the treatment liquid pools on portions of the substrate surface causing particle adhesion
Solution Approach 1:
The nozzle is changed from a fixed position to a movable position that follows the swing arm's movement. The nozzle unit is configured to move along the arc trajectory of the substrate surface, ensuring uniform liquid distribution across the entire substrate area while maintaining stable supply. This dynamic positioning resolves the contradiction by adapting the nozzle position to match the substrate treatment requirements.
2Manufacturing precision
If the substrate is scanned by a physical tool, then surface treatment is effective, but the swing arm body causes treatment liquid to splash and leave watermarks
Solution Approach 1:
The nozzle unit is integrated with the swing arm body such that they move together as a single coordinated system. The nozzle follows the same arc trajectory as the physical tool, ensuring that liquid is supplied uniformly without pooling or splashing. This merging of movements eliminates the harmful splashing effect while maintaining effective surface treatment.
3Manufacturing precision
If treatment liquid is supplied continuously, then coatability is maintained, but the substrate surface dries during treatment causing water marks
Solution Approach 1:
The movable nozzle ensures continuous and uniform liquid supply across the entire substrate surface during rotation. By following the substrate's arc trajectory, the nozzle maintains constant contact and liquid flow, preventing any portion of the substrate from drying out. This continuous action maintains coatability while preventing watermark formation through proper liquid distribution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances coatability and prevents water marks on the substrate surface by synchronized movement of physical and nozzle units, ensuring effective cleaning and drying without leaving residues.
Implementation Method 1
the coatability of the liquid on the substrate is impaired. Consequently, water marks (spots left by water) are left on the surface of the substrate
Implementation Method 2
the surface of the substrate becomes so dry during the treatment that the coatability of the liquid on the substrate is impaired
Data Source
AI summary
Provided is a substrate treatment apparatus that treats a surface of a substrate while rotating the substrate. The substrate treatment apparatus includes: a physical tool unit including a physical tool configured to treat the surface of the substrate; a nozzle unit including a liquid supply nozzle configured to supply a liquid to the surface of the substrate and a gas supply nozzle configured to supply a gas to the surface of the substrate; a physical-tool-unit moving mechanism configured to move the physical tool unit along the surface of the substrate; and a nozzle-unit moving mechanism configured to move the nozzle unit along the surface of the substrate.