Substrate Treatment Nozzle System with Opposing Rotation
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Solution Overview
Problem
The existing substrate treating processes using stream and slit nozzles face inefficiencies, including longer development times and pattern slope differences due to uneven photoresist film peeling during the development process, particularly when the substrate rotates in one direction.
Innovation Solution
A substrate treating apparatus and method that employs a combination of a pre-treatment nozzle for a stream discharge and a main nozzle for a liquid curtain discharge, with opposite rotational directions and adjustable speeds, to uniformly treat the substrate, minimizing stains and pattern slope discrepancies.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a stream nozzle is used for liquid treatment, then the liquid film thickness is reduced, but the development time increases
Solution Approach 1:
The liquid treatment system is segmented into two distinct nozzles: a stream nozzle for initial liquid application and a curtain nozzle for subsequent uniform distribution. This segmentation allows each nozzle to perform its specialized function optimally, achieving both thin liquid film formation and efficient development time
Solution Approach 2:
The stream nozzle performs preliminary liquid treatment by discharging liquid in a stream to form an initial liquid film on the substrate. This preliminary action prepares the substrate surface before the curtain nozzle applies the development liquid, enabling faster overall processing while maintaining precise liquid film control
2Productivity
If a slit nozzle is used for liquid treatment, then the development time is reduced, but stains are generated on the substrate
Solution Approach 1:
The system segments the liquid treatment into two stages: the stream nozzle stage for initial liquid application and the curtain nozzle stage for stain-free development. This segmentation eliminates stains by ensuring proper liquid distribution before development begins, while maintaining fast processing speed
Solution Approach 2:
The stream nozzle performs a preliminary liquid treatment that prepares the substrate surface by forming an appropriate liquid film. This preliminary action prevents stains during the subsequent development process by ensuring uniform liquid distribution, achieving both fast development and stain-free results
3Ease of operation
If the substrate rotates in one direction during liquid treatment, then the photosensitive film peels at an inclination, but pattern slope uniformity deteriorates
Solution Approach 1:
The substrate rotation direction is inverted between the two treatment stages. During stream nozzle treatment, the substrate rotates in one direction, and during curtain nozzle treatment, it rotates in the opposite direction. This inversion compensates for inclination effects and ensures uniform pattern slopes on both sides of the substrate
Solution Approach 2:
The substrate rotation direction changes periodically between the two treatment stages. This periodic reversal of rotation direction prevents cumulative inclination effects, ensuring that photosensitive film peeling occurs uniformly and pattern slopes remain consistent across the entire substrate surface
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the efficiency of the substrate treatment process by reducing development time and preventing pattern slope differences, ensuring uniform treatment and improved development efficiency.
Implementation Method 1
a pre-treatment nozzle that discharges a first treatment liquid in a stream scheme
Implementation Method 2
a main nozzle that discharges a second treatment liquid in a liquid curtain scheme
Implementation Method 3
a controller that controls the support unit such that a rotational direction of the substrate when the first treatment liquid is discharged from the main nozzle and a rotational direction of the substrate when the second treatment liquid is discharged from the pre-treatment nozzle are opposite to each other
Data Source
AI summary
The inventive concept provides a substrate treating apparatus and a substrate treating method. The sub substrate treating apparatus may include a support unit that supports a substrate, a liquid supply unit that supplies a liquid onto the substrate supported by the support unit, and a controller that controls the liquid supply unit and the support unit, the liquid supply unit may include a pre-treatment nozzle that discharges a first treatment liquid in a stream scheme, and a main nozzle that discharges a second treatment liquid in a liquid curtain scheme, and the controller may control the support unit such that a rotational direction of the substrate when the first treatment liquid is discharged from the main nozzle and a rotational direction of the substrate when the second treatment liquid is discharged from the pre-treatment nozzle are opposite to each other.