Substrate Treatment Controller Pull-Up Dynamics
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Solution Overview
Problem
Existing substrate treatment systems face challenges in minimizing the amount of treatment solution adhering to substrates and holders, which increases costs due to the need for frequent replenishment, while also impacting throughput when attempting to reduce solution loss by adjusting pulling-up speeds or stopping mechanisms.
Innovation Solution
A substrate treatment apparatus with a controller that optimizes the pulling-up time and transfer schedule to extend the time required for substrate pulling-up from previous treatment chambers based on waiting times, allowing for reduced solution loss without compromising throughput by allocating waiting times to the pulling-up process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate holder is pulled up at a high speed, then the throughput of the apparatus is maintained, but the amount of treatment solution taken out increases
Solution Approach 1:
The patent applies dynamics by making the pulling-up speed variable rather than fixed. The control device dynamically adjusts the pulling-up speed based on real-time conditions (substrate type, treatment solution properties, chamber conditions) to optimize the balance between throughput and solution loss. This allows the system to adapt the pulling-up speed to different operational scenarios, reducing solution loss when conditions permit and maintaining high speed when throughput is critical.
Solution Approach 2:
The patent changes the parameter of pulling-up speed from a fixed preset value to a dynamically adjustable parameter. By modifying this key parameter based on various factors (substrate characteristics, treatment solution viscosity, chamber pressure, temperature), the system can optimize the trade-off between solution loss and throughput for different operating conditions.
2Loss of substance
If the substrate holder is stopped after pulling up to allow solution to drip back, then the amount of treatment solution taken out is reduced, but the pulling-up required time increases
Solution Approach 1:
The patent applies dynamics by making the pulling-up operation flexible rather than fixed. Instead of a predetermined stop duration, the system dynamically determines whether to stop and for how long based on real-time conditions. The control device evaluates factors such as solution viscosity, substrate weight, and chamber pressure to decide on the optimal stopping strategy, thereby minimizing time loss while achieving solution recovery.
Solution Approach 2:
The patent applies preliminary action by pre-calculating and storing optimal pulling-up parameters (speed profiles, stop durations) for different substrate and treatment solution combinations. Before actual operation, the system selects the appropriate pre-calculated parameters based on the current treatment conditions, enabling quick decision-making without real-time complex calculations.
3Ease of operation
If a fixed pulling-up speed is used based on experimental data, then the operation is simple, but the system cannot adapt to varying treatment conditions to further reduce solution loss
Solution Approach 1:
The patent applies feedback by implementing a control device that monitors actual treatment conditions and adjusts pulling-up parameters accordingly. The system receives feedback from sensors (flow rate, pressure, temperature, substrate position) and uses this information to dynamically optimize the pulling-up speed and stopping behavior, thereby reducing solution loss while maintaining operational simplicity through automated control.
Solution Approach 2:
The patent applies self-service by enabling the system to automatically adjust its own operating parameters without external intervention. The control device autonomously selects and modifies pulling-up speed profiles based on detected treatment conditions, making the system self-optimizing and reducing the need for manual parameter adjustment while minimizing solution loss.
Data Source
AI summary
A substrate treatment apparatus includes a plurality of treatment chambers performing different treatment types on a substrate; a transfer device; and a controller that controls the transfer of the substrate and the substrate treatment. The controller enables fixation of a time for pulling up the substrate for each treatment chambers/treatment type and creation of a transfer schedule for transferring the substrate among the plurality of treatment chambers/treatment types and treating the substrate so as to maximize throughput, and enables correction of the transfer schedule to extend, based on a waiting time of the transfer device after storage of the substrate into a treatment chamber of one treatment type and a waiting time of the treatment chamber after treatment of the substrate, a time required for pulling up the substrate from a treatment chamber of an immediately previous treatment type in transfer order of the substrate.